Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography
Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an...
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| Format: | Article |
| Language: | English |
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MDPI AG
2019-05-01
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| Series: | Sensors |
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| Online Access: | https://www.mdpi.com/1424-8220/19/9/2182 |
| _version_ | 1828395847567540224 |
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| author | Chiara Valsecchi Luis Enrique Gomez Armas Jacson Weber de Menezes |
| author_facet | Chiara Valsecchi Luis Enrique Gomez Armas Jacson Weber de Menezes |
| author_sort | Chiara Valsecchi |
| collection | DOAJ |
| description | Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an efficient, flexible, and scalable production method. The transmission spectra in air of the 1 cm<sup>2</sup> substrate were evaluated to study the substrate behavior when hole-size, periodicity, and film thickness are varied, in order to elucidate the best sample for the most effective sensing performance. The efficiency of the nanohole array was tested for bulk sensing and compared with other platforms found in the literature. The sensitivity of ~1000 nm/RIU, achieved with an array periodicity in the visible range, exceeds near infrared (NIR) performances previously reported, and demonstrates that interference lithography is one of the best alternative to other expensive and time-consuming nanofabrication methods. |
| first_indexed | 2024-12-10T08:20:29Z |
| format | Article |
| id | doaj.art-b4e736867e5b41d28ec2cc82412c702c |
| institution | Directory Open Access Journal |
| issn | 1424-8220 |
| language | English |
| last_indexed | 2024-12-10T08:20:29Z |
| publishDate | 2019-05-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Sensors |
| spelling | doaj.art-b4e736867e5b41d28ec2cc82412c702c2022-12-22T01:56:21ZengMDPI AGSensors1424-82202019-05-01199218210.3390/s19092182s19092182Large Area Nanohole Arrays for Sensing Fabricated by Interference LithographyChiara Valsecchi0Luis Enrique Gomez Armas1Jacson Weber de Menezes2Engineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, BrazilEngineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, BrazilEngineering Department, Universidade Federal do Pampa, Alegrete 97546-550, RS, BrazilSeveral fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an efficient, flexible, and scalable production method. The transmission spectra in air of the 1 cm<sup>2</sup> substrate were evaluated to study the substrate behavior when hole-size, periodicity, and film thickness are varied, in order to elucidate the best sample for the most effective sensing performance. The efficiency of the nanohole array was tested for bulk sensing and compared with other platforms found in the literature. The sensitivity of ~1000 nm/RIU, achieved with an array periodicity in the visible range, exceeds near infrared (NIR) performances previously reported, and demonstrates that interference lithography is one of the best alternative to other expensive and time-consuming nanofabrication methods.https://www.mdpi.com/1424-8220/19/9/2182holographyoptics at surfacessurface plasmonssubwavelength structuresnanostructuresbiological sensing and sensors |
| spellingShingle | Chiara Valsecchi Luis Enrique Gomez Armas Jacson Weber de Menezes Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography Sensors holography optics at surfaces surface plasmons subwavelength structures nanostructures biological sensing and sensors |
| title | Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography |
| title_full | Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography |
| title_fullStr | Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography |
| title_full_unstemmed | Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography |
| title_short | Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography |
| title_sort | large area nanohole arrays for sensing fabricated by interference lithography |
| topic | holography optics at surfaces surface plasmons subwavelength structures nanostructures biological sensing and sensors |
| url | https://www.mdpi.com/1424-8220/19/9/2182 |
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