CALIBRATION OF THE SYSTEM USED FOR CONDUCTOR INSPECTION AT MICROCHIP SUBSTRATE
The article describes the calibration method of the photometric system for a particular purpose of estimation position of the conductor connecting the semiconductor chip and the substrate. A nonlinear model of the camera lens distortion, which allows estimating the position of the conductor in a thr...
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| Format: | Article |
| Language: | Russian |
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Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-06-01
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| Series: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
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| Online Access: | https://doklady.bsuir.by/jour/article/view/229 |
| Summary: | The article describes the calibration method of the photometric system for a particular purpose of estimation position of the conductor connecting the semiconductor chip and the substrate. A nonlinear model of the camera lens distortion, which allows estimating the position of the conductor in a three-dimensional space with the required accuracy is described. The novelty of the described technique is to provide the required accuracy of conductor parameters measurement with a high processing speed. |
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| ISSN: | 1729-7648 |