An ab initio study on resistance switching in hexagonal boron nitride

Abstract Two-dimensional materials have been widely investigated to implement memristive devices for data storage or neuromorphic computing applications because of their ultra-scaled thicknesses and clean interfaces. For example, resistance switching in hexagonal boron nitride (h-BN) has been demons...

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Main Authors: Fabian Ducry, Dominic Waldhoer, Theresia Knobloch, Miklos Csontos, Nadia Jimenez Olalla, Juerg Leuthold, Tibor Grasser, Mathieu Luisier
Format: Article
Language:English
Published: Nature Portfolio 2022-09-01
Series:npj 2D Materials and Applications
Online Access:https://doi.org/10.1038/s41699-022-00340-6
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author Fabian Ducry
Dominic Waldhoer
Theresia Knobloch
Miklos Csontos
Nadia Jimenez Olalla
Juerg Leuthold
Tibor Grasser
Mathieu Luisier
author_facet Fabian Ducry
Dominic Waldhoer
Theresia Knobloch
Miklos Csontos
Nadia Jimenez Olalla
Juerg Leuthold
Tibor Grasser
Mathieu Luisier
author_sort Fabian Ducry
collection DOAJ
description Abstract Two-dimensional materials have been widely investigated to implement memristive devices for data storage or neuromorphic computing applications because of their ultra-scaled thicknesses and clean interfaces. For example, resistance switching in hexagonal boron nitride (h-BN) has been demonstrated. This mechanism is most of the time attributed to the movement of metallic ions. It has however also been reported when h-BN is contacted with two inert electrodes such as graphene or Pt. We suggest here that the switching mechanism of the latter devices, which has not yet been clearly established, relies on locals change of the electronic structure of h-BN as caused by atomic defects, e.g., multi-vacancies. This class of intrinsic h-BN defects can create electrically controllable interlayer bridges. We use a combination of hybrid density functional theory and the Non-equilibrium Green’s function formalism to show that a single interlayer bridge resulting from the presence of a trivacancy in a graphene/h-BN/graphene stack leads to a switching voltage of ~5 V and a high-to-low resistance ratio >100. Both values lie within the reported experimental range and thus confirm the likelihood that intrinsic defects play a key role in the resistance switching of h-BN in contact with inert electrodes.
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spelling doaj.art-b5f0f2941d84422d9bc5ba6417e6d7f82022-12-22T04:24:47ZengNature Portfolionpj 2D Materials and Applications2397-71322022-09-016111010.1038/s41699-022-00340-6An ab initio study on resistance switching in hexagonal boron nitrideFabian Ducry0Dominic Waldhoer1Theresia Knobloch2Miklos Csontos3Nadia Jimenez Olalla4Juerg Leuthold5Tibor Grasser6Mathieu Luisier7Integrated Systems Laboratory, ETH ZurichInstitute for Microelectronics, TU WienInstitute for Microelectronics, TU WienInstitute of Electromagnetic Fields, ETH ZurichInstitute of Electromagnetic Fields, ETH ZurichInstitute of Electromagnetic Fields, ETH ZurichInstitute for Microelectronics, TU WienIntegrated Systems Laboratory, ETH ZurichAbstract Two-dimensional materials have been widely investigated to implement memristive devices for data storage or neuromorphic computing applications because of their ultra-scaled thicknesses and clean interfaces. For example, resistance switching in hexagonal boron nitride (h-BN) has been demonstrated. This mechanism is most of the time attributed to the movement of metallic ions. It has however also been reported when h-BN is contacted with two inert electrodes such as graphene or Pt. We suggest here that the switching mechanism of the latter devices, which has not yet been clearly established, relies on locals change of the electronic structure of h-BN as caused by atomic defects, e.g., multi-vacancies. This class of intrinsic h-BN defects can create electrically controllable interlayer bridges. We use a combination of hybrid density functional theory and the Non-equilibrium Green’s function formalism to show that a single interlayer bridge resulting from the presence of a trivacancy in a graphene/h-BN/graphene stack leads to a switching voltage of ~5 V and a high-to-low resistance ratio >100. Both values lie within the reported experimental range and thus confirm the likelihood that intrinsic defects play a key role in the resistance switching of h-BN in contact with inert electrodes.https://doi.org/10.1038/s41699-022-00340-6
spellingShingle Fabian Ducry
Dominic Waldhoer
Theresia Knobloch
Miklos Csontos
Nadia Jimenez Olalla
Juerg Leuthold
Tibor Grasser
Mathieu Luisier
An ab initio study on resistance switching in hexagonal boron nitride
npj 2D Materials and Applications
title An ab initio study on resistance switching in hexagonal boron nitride
title_full An ab initio study on resistance switching in hexagonal boron nitride
title_fullStr An ab initio study on resistance switching in hexagonal boron nitride
title_full_unstemmed An ab initio study on resistance switching in hexagonal boron nitride
title_short An ab initio study on resistance switching in hexagonal boron nitride
title_sort ab initio study on resistance switching in hexagonal boron nitride
url https://doi.org/10.1038/s41699-022-00340-6
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