Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes
Contact resistance between electrically connected parts of electronic elements can negatively affect their resulting properties and parameters. The contact resistance is influenced by the physicochemical properties of the connected elements and, in most cases, the lowest possible value is required....
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MDPI AG
2022-12-01
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Series: | Nanomaterials |
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Online Access: | https://www.mdpi.com/2079-4991/12/24/4444 |
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author | Tomáš Blecha Zuzana Vlčková Živcová Farjana J. Sonia Martin Mergl Oleksandr Volochanskyi Michal Bodnár Pavel Rous Kenichiro Mizohata Martin Kalbáč Otakar Frank |
author_facet | Tomáš Blecha Zuzana Vlčková Živcová Farjana J. Sonia Martin Mergl Oleksandr Volochanskyi Michal Bodnár Pavel Rous Kenichiro Mizohata Martin Kalbáč Otakar Frank |
author_sort | Tomáš Blecha |
collection | DOAJ |
description | Contact resistance between electrically connected parts of electronic elements can negatively affect their resulting properties and parameters. The contact resistance is influenced by the physicochemical properties of the connected elements and, in most cases, the lowest possible value is required. The issue of contact resistance is also addressed in connection with the increasingly frequently used carbon allotropes. This work aimed to determine the factors that influence contact resistance between graphene prepared by chemical vapour deposition and pre-patterned Cu and Au electrodes onto which graphene is subsequently transferred. It was found that electrode surface treatment methods affect the resistance between Cu and graphene, where contact resistance varied greatly, with an average of 1.25 ± 1.54 kΩ, whereas for the Au electrodes, the deposition techniques did not influence the resulting contact resistance, which decreased by almost two orders of magnitude compared with the Cu electrodes, to 0.03 ± 0.01 kΩ. |
first_indexed | 2024-03-09T16:01:37Z |
format | Article |
id | doaj.art-b77406e11ba34c669188acdbd07b6185 |
institution | Directory Open Access Journal |
issn | 2079-4991 |
language | English |
last_indexed | 2024-03-09T16:01:37Z |
publishDate | 2022-12-01 |
publisher | MDPI AG |
record_format | Article |
series | Nanomaterials |
spelling | doaj.art-b77406e11ba34c669188acdbd07b61852023-11-24T17:04:29ZengMDPI AGNanomaterials2079-49912022-12-011224444410.3390/nano12244444Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au ElectrodesTomáš Blecha0Zuzana Vlčková Živcová1Farjana J. Sonia2Martin Mergl3Oleksandr Volochanskyi4Michal Bodnár5Pavel Rous6Kenichiro Mizohata7Martin Kalbáč8Otakar Frank9Faculty of Electrical Engineering, University of West Bohemia, Univerzitní 2795/8, 301 00 Pilsen, Czech RepublicJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech RepublicJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech RepublicJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech RepublicJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech RepublicTesla Blatná a.s., Palackého 644, 388 01 Blatná, Czech RepublicFaculty of Electrical Engineering, University of West Bohemia, Univerzitní 2795/8, 301 00 Pilsen, Czech RepublicDepartment of Physics, Helsinki University, P.O. Box 43, 00014 Helsinki, FinlandJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech RepublicJ. Heyrovsky Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolejškova 2155/3, 182 23 Prague, Czech RepublicContact resistance between electrically connected parts of electronic elements can negatively affect their resulting properties and parameters. The contact resistance is influenced by the physicochemical properties of the connected elements and, in most cases, the lowest possible value is required. The issue of contact resistance is also addressed in connection with the increasingly frequently used carbon allotropes. This work aimed to determine the factors that influence contact resistance between graphene prepared by chemical vapour deposition and pre-patterned Cu and Au electrodes onto which graphene is subsequently transferred. It was found that electrode surface treatment methods affect the resistance between Cu and graphene, where contact resistance varied greatly, with an average of 1.25 ± 1.54 kΩ, whereas for the Au electrodes, the deposition techniques did not influence the resulting contact resistance, which decreased by almost two orders of magnitude compared with the Cu electrodes, to 0.03 ± 0.01 kΩ.https://www.mdpi.com/2079-4991/12/24/4444graphenecontact resistancetransfer length methodgraphene–metal contact |
spellingShingle | Tomáš Blecha Zuzana Vlčková Živcová Farjana J. Sonia Martin Mergl Oleksandr Volochanskyi Michal Bodnár Pavel Rous Kenichiro Mizohata Martin Kalbáč Otakar Frank Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes Nanomaterials graphene contact resistance transfer length method graphene–metal contact |
title | Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes |
title_full | Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes |
title_fullStr | Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes |
title_full_unstemmed | Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes |
title_short | Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes |
title_sort | electrical contact resistance of large area graphene on pre patterned cu and au electrodes |
topic | graphene contact resistance transfer length method graphene–metal contact |
url | https://www.mdpi.com/2079-4991/12/24/4444 |
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