One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma

One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma

This paper presents the dry etching characteristics of indium tin oxide (ITO)/Ag/ITO multilayered thin film, used as a pixel electrode in a high-resolution active-matrix organic light-emitting diode (AMOLED) device. Dry etching was performed using a combination of H<sub>2</sub> and HCl g...

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Bibliographic Details
Main Authors:	Ho-Won Yoon, Seung-Min Shin, Seong-Yong Kwon, Hyun-Min Cho, Sang-Gab Kim, Mun-Pyo Hong
Format:	Article
Language:	English
Published:	MDPI AG 2021-04-01
Series:	Materials
Subjects:	ITO/Ag/ITO multilayer one-step dry etch H<sub>2</sub>/HCl gas ECR-RIE TE-OLED
Online Access:	https://www.mdpi.com/1996-1944/14/8/2025

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