Structural and Optical Properties of Silicon Nanowire Arrays Fabricated by Metal Assisted Chemical Etching With Ammonium Fluoride

Structural and Optical Properties of Silicon Nanowire Arrays Fabricated by Metal Assisted Chemical Etching With Ammonium Fluoride

Here we report on the metal assisted chemical etching method of silicon nanowires (SiNWs) manufacturing, where the commonly used hydrofluoric acid (HF) has been successfully replaced with ammonium fluoride (NH4F). The mechanism of the etching process and the effect of the pH values of H2O2: NH4F sol...

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Bibliographic Details
Main Authors: Kirill A. Gonchar, Veronika Y. Kitaeva, George A. Zharik, Andrei A. Eliseev, Liubov A. Osminkina
Format: Article
Language:English
Published: Frontiers Media S.A. 2019-01-01
Series:Frontiers in Chemistry
Subjects:
silicon nanowires
impedance
total reflectance
photoluminescence
Raman scattering
Online Access:https://www.frontiersin.org/article/10.3389/fchem.2018.00653/full

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