Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review
We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, proc...
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| Format: | Article |
| Language: | English |
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MDPI AG
2018-06-01
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| Series: | Sensors |
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| Online Access: | http://www.mdpi.com/1424-8220/18/6/1797 |
| _version_ | 1798025445684281344 |
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| author | Abid Iqbal Faisal Mohd-Yasin |
| author_facet | Abid Iqbal Faisal Mohd-Yasin |
| author_sort | Abid Iqbal |
| collection | DOAJ |
| description | We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, processes and equipment. This review will be a good starting point to catch up with the state-of-the-arts research on the reactive sputtering of AlN (002) thin film, as well as its evolving list of piezoelectric applications such as energy harvesters. |
| first_indexed | 2024-04-11T18:19:09Z |
| format | Article |
| id | doaj.art-bcb0b35b4bc042bcbfd25ccb4dce8223 |
| institution | Directory Open Access Journal |
| issn | 1424-8220 |
| language | English |
| last_indexed | 2024-04-11T18:19:09Z |
| publishDate | 2018-06-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Sensors |
| spelling | doaj.art-bcb0b35b4bc042bcbfd25ccb4dce82232022-12-22T04:09:49ZengMDPI AGSensors1424-82202018-06-01186179710.3390/s18061797s18061797Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A ReviewAbid Iqbal0Faisal Mohd-Yasin1Queensland Micro- and Nanotechnology Centre, Griffith University, Nathan, QLD 4111, AustraliaQueensland Micro- and Nanotechnology Centre, Griffith University, Nathan, QLD 4111, AustraliaWe summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, processes and equipment. This review will be a good starting point to catch up with the state-of-the-arts research on the reactive sputtering of AlN (002) thin film, as well as its evolving list of piezoelectric applications such as energy harvesters.http://www.mdpi.com/1424-8220/18/6/1797physical vapor depositionsputteringaluminum nitridepiezoelectricenergy harvester |
| spellingShingle | Abid Iqbal Faisal Mohd-Yasin Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review Sensors physical vapor deposition sputtering aluminum nitride piezoelectric energy harvester |
| title | Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review |
| title_full | Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review |
| title_fullStr | Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review |
| title_full_unstemmed | Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review |
| title_short | Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review |
| title_sort | reactive sputtering of aluminum nitride 002 thin films for piezoelectric applications a review |
| topic | physical vapor deposition sputtering aluminum nitride piezoelectric energy harvester |
| url | http://www.mdpi.com/1424-8220/18/6/1797 |
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