High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography
Imaging applications based on microlens arrays (MLAs) have a great potential for the depth sensor, wide field-of-view camera and the reconstructed hologram. However, the narrow depth-of-field remains the challenge for accurate, reliable depth estimation. Multifocal microlens array (Mf-MLAs) is perce...
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MDPI AG
2020-11-01
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Online Access: | https://www.mdpi.com/2072-666X/11/12/1068 |
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author | Joong Hoon Lee Sehui Chang Min Seok Kim Yeong Jae Kim Hyun Myung Kim Young Min Song |
author_facet | Joong Hoon Lee Sehui Chang Min Seok Kim Yeong Jae Kim Hyun Myung Kim Young Min Song |
author_sort | Joong Hoon Lee |
collection | DOAJ |
description | Imaging applications based on microlens arrays (MLAs) have a great potential for the depth sensor, wide field-of-view camera and the reconstructed hologram. However, the narrow depth-of-field remains the challenge for accurate, reliable depth estimation. Multifocal microlens array (Mf-MLAs) is perceived as a major breakthrough, but existing fabrication methods are still hindered by the expensive, low-throughput, and dissimilar numerical aperture (NA) of individual lenses due to the multiple steps in the photolithography process. This paper reports the fabrication method of high NA, Mf-MLAs for the extended depth-of-field using single-step photolithography assisted by chemical wet etching. The various lens parameters of Mf-MLAs are manipulated by the multi-sized hole photomask and the wet etch time. Theoretical and experimental results show that the Mf-MLAs have three types of lens with different focal lengths, while maintaining the uniform and high NA irrespective of the lens type. Additionally, we demonstrate the multi-focal plane image acquisition via Mf-MLAs integrated into a microscope. |
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issn | 2072-666X |
language | English |
last_indexed | 2024-03-10T14:26:31Z |
publishDate | 2020-11-01 |
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series | Micromachines |
spelling | doaj.art-bcc1a8c3e39349dda059cc5715422c6c2023-11-20T22:59:48ZengMDPI AGMicromachines2072-666X2020-11-011112106810.3390/mi11121068High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning PhotolithographyJoong Hoon Lee0Sehui Chang1Min Seok Kim2Yeong Jae Kim3Hyun Myung Kim4Young Min Song5School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaImaging applications based on microlens arrays (MLAs) have a great potential for the depth sensor, wide field-of-view camera and the reconstructed hologram. However, the narrow depth-of-field remains the challenge for accurate, reliable depth estimation. Multifocal microlens array (Mf-MLAs) is perceived as a major breakthrough, but existing fabrication methods are still hindered by the expensive, low-throughput, and dissimilar numerical aperture (NA) of individual lenses due to the multiple steps in the photolithography process. This paper reports the fabrication method of high NA, Mf-MLAs for the extended depth-of-field using single-step photolithography assisted by chemical wet etching. The various lens parameters of Mf-MLAs are manipulated by the multi-sized hole photomask and the wet etch time. Theoretical and experimental results show that the Mf-MLAs have three types of lens with different focal lengths, while maintaining the uniform and high NA irrespective of the lens type. Additionally, we demonstrate the multi-focal plane image acquisition via Mf-MLAs integrated into a microscope.https://www.mdpi.com/2072-666X/11/12/1068optical MEMSmicrolens arraymultiple focal lengthsthree-dimensional imaging |
spellingShingle | Joong Hoon Lee Sehui Chang Min Seok Kim Yeong Jae Kim Hyun Myung Kim Young Min Song High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography Micromachines optical MEMS microlens array multiple focal lengths three-dimensional imaging |
title | High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography |
title_full | High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography |
title_fullStr | High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography |
title_full_unstemmed | High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography |
title_short | High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography |
title_sort | high identical numerical aperture multifocal microlens array through single step multi sized hole patterning photolithography |
topic | optical MEMS microlens array multiple focal lengths three-dimensional imaging |
url | https://www.mdpi.com/2072-666X/11/12/1068 |
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