High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography

Imaging applications based on microlens arrays (MLAs) have a great potential for the depth sensor, wide field-of-view camera and the reconstructed hologram. However, the narrow depth-of-field remains the challenge for accurate, reliable depth estimation. Multifocal microlens array (Mf-MLAs) is perce...

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Main Authors: Joong Hoon Lee, Sehui Chang, Min Seok Kim, Yeong Jae Kim, Hyun Myung Kim, Young Min Song
Format: Article
Language:English
Published: MDPI AG 2020-11-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/11/12/1068
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author Joong Hoon Lee
Sehui Chang
Min Seok Kim
Yeong Jae Kim
Hyun Myung Kim
Young Min Song
author_facet Joong Hoon Lee
Sehui Chang
Min Seok Kim
Yeong Jae Kim
Hyun Myung Kim
Young Min Song
author_sort Joong Hoon Lee
collection DOAJ
description Imaging applications based on microlens arrays (MLAs) have a great potential for the depth sensor, wide field-of-view camera and the reconstructed hologram. However, the narrow depth-of-field remains the challenge for accurate, reliable depth estimation. Multifocal microlens array (Mf-MLAs) is perceived as a major breakthrough, but existing fabrication methods are still hindered by the expensive, low-throughput, and dissimilar numerical aperture (NA) of individual lenses due to the multiple steps in the photolithography process. This paper reports the fabrication method of high NA, Mf-MLAs for the extended depth-of-field using single-step photolithography assisted by chemical wet etching. The various lens parameters of Mf-MLAs are manipulated by the multi-sized hole photomask and the wet etch time. Theoretical and experimental results show that the Mf-MLAs have three types of lens with different focal lengths, while maintaining the uniform and high NA irrespective of the lens type. Additionally, we demonstrate the multi-focal plane image acquisition via Mf-MLAs integrated into a microscope.
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spelling doaj.art-bcc1a8c3e39349dda059cc5715422c6c2023-11-20T22:59:48ZengMDPI AGMicromachines2072-666X2020-11-011112106810.3390/mi11121068High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning PhotolithographyJoong Hoon Lee0Sehui Chang1Min Seok Kim2Yeong Jae Kim3Hyun Myung Kim4Young Min Song5School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaSchool of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju 61005, KoreaImaging applications based on microlens arrays (MLAs) have a great potential for the depth sensor, wide field-of-view camera and the reconstructed hologram. However, the narrow depth-of-field remains the challenge for accurate, reliable depth estimation. Multifocal microlens array (Mf-MLAs) is perceived as a major breakthrough, but existing fabrication methods are still hindered by the expensive, low-throughput, and dissimilar numerical aperture (NA) of individual lenses due to the multiple steps in the photolithography process. This paper reports the fabrication method of high NA, Mf-MLAs for the extended depth-of-field using single-step photolithography assisted by chemical wet etching. The various lens parameters of Mf-MLAs are manipulated by the multi-sized hole photomask and the wet etch time. Theoretical and experimental results show that the Mf-MLAs have three types of lens with different focal lengths, while maintaining the uniform and high NA irrespective of the lens type. Additionally, we demonstrate the multi-focal plane image acquisition via Mf-MLAs integrated into a microscope.https://www.mdpi.com/2072-666X/11/12/1068optical MEMSmicrolens arraymultiple focal lengthsthree-dimensional imaging
spellingShingle Joong Hoon Lee
Sehui Chang
Min Seok Kim
Yeong Jae Kim
Hyun Myung Kim
Young Min Song
High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography
Micromachines
optical MEMS
microlens array
multiple focal lengths
three-dimensional imaging
title High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography
title_full High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography
title_fullStr High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography
title_full_unstemmed High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography
title_short High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography
title_sort high identical numerical aperture multifocal microlens array through single step multi sized hole patterning photolithography
topic optical MEMS
microlens array
multiple focal lengths
three-dimensional imaging
url https://www.mdpi.com/2072-666X/11/12/1068
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