Defect phase diagram for doping of Ga2O3

For the case of n-type doping of β-Ga2O3 by group 14 dopants (C, Si, Ge, Sn), a defect phase diagram is constructed from defect equilibria calculated over a range of temperatures (T), O partial pressures (pO2), and dopant concentrations. The underlying defect levels and formation energies are determ...

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Main Author: Stephan Lany
Format: Article
Language:English
Published: AIP Publishing LLC 2018-04-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/1.5019938
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author Stephan Lany
author_facet Stephan Lany
author_sort Stephan Lany
collection DOAJ
description For the case of n-type doping of β-Ga2O3 by group 14 dopants (C, Si, Ge, Sn), a defect phase diagram is constructed from defect equilibria calculated over a range of temperatures (T), O partial pressures (pO2), and dopant concentrations. The underlying defect levels and formation energies are determined from first-principles supercell calculations with GW bandgap corrections. Only Si is found to be a truly shallow donor, C is a deep DX-like (lattice relaxed donor) center, and Ge and Sn have defect levels close to the conduction band minimum. The thermodynamic modeling includes the effect of association of dopant-defect pairs and complexes, which causes the net doping to decline when exceeding a certain optimal dopant concentration. The optimal doping levels are surprisingly low, between about 0.01% and 1% of cation substitution, depending on the (T, pO2) conditions. Considering further the stability constraints due to sublimation of molecular Ga2O, specific predictions of optimized pO2 and Si dopant concentrations are given. The incomplete passivation of dopant-defect complexes in β-Ga2O3 suggests a design rule for metastable doping above the solubility limit.
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spelling doaj.art-bd0b283d4c864e0e9654e3e50df13d582022-12-22T03:15:36ZengAIP Publishing LLCAPL Materials2166-532X2018-04-0164046103046103-910.1063/1.5019938002804APMDefect phase diagram for doping of Ga2O3Stephan Lany0National Renewable Energy Laboratory, Golden, Colorado 80401, USAFor the case of n-type doping of β-Ga2O3 by group 14 dopants (C, Si, Ge, Sn), a defect phase diagram is constructed from defect equilibria calculated over a range of temperatures (T), O partial pressures (pO2), and dopant concentrations. The underlying defect levels and formation energies are determined from first-principles supercell calculations with GW bandgap corrections. Only Si is found to be a truly shallow donor, C is a deep DX-like (lattice relaxed donor) center, and Ge and Sn have defect levels close to the conduction band minimum. The thermodynamic modeling includes the effect of association of dopant-defect pairs and complexes, which causes the net doping to decline when exceeding a certain optimal dopant concentration. The optimal doping levels are surprisingly low, between about 0.01% and 1% of cation substitution, depending on the (T, pO2) conditions. Considering further the stability constraints due to sublimation of molecular Ga2O, specific predictions of optimized pO2 and Si dopant concentrations are given. The incomplete passivation of dopant-defect complexes in β-Ga2O3 suggests a design rule for metastable doping above the solubility limit.http://dx.doi.org/10.1063/1.5019938
spellingShingle Stephan Lany
Defect phase diagram for doping of Ga2O3
APL Materials
title Defect phase diagram for doping of Ga2O3
title_full Defect phase diagram for doping of Ga2O3
title_fullStr Defect phase diagram for doping of Ga2O3
title_full_unstemmed Defect phase diagram for doping of Ga2O3
title_short Defect phase diagram for doping of Ga2O3
title_sort defect phase diagram for doping of ga2o3
url http://dx.doi.org/10.1063/1.5019938
work_keys_str_mv AT stephanlany defectphasediagramfordopingofga2o3