Patterning of SiO2 interfaces for radiative cooling applications
Silicon dioxide (SiO2) is a prominent material for radiative cooling applications due to its negligible absorption at solar wavelengths (0.25-2.5 µm) and exceptional stability. However, at thermal infrared wavelengths, its bulk phonon-polariton band introduces a strong reflection peak inside the atm...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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EDP Sciences
2023-01-01
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| Series: | EPJ Web of Conferences |
| Online Access: | https://www.epj-conferences.org/articles/epjconf/pdf/2023/13/epjconf_eosam2023_04026.pdf |
| _version_ | 1797634921142943744 |
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| author | Zhenmin Ding Jérémy Werlé Xin Li Hongbo Xu Lei Pan Yao Li Lorenzo Pattelli |
| author_facet | Zhenmin Ding Jérémy Werlé Xin Li Hongbo Xu Lei Pan Yao Li Lorenzo Pattelli |
| author_sort | Zhenmin Ding |
| collection | DOAJ |
| description | Silicon dioxide (SiO2) is a prominent material for radiative cooling applications due to its negligible absorption at solar wavelengths (0.25-2.5 µm) and exceptional stability. However, at thermal infrared wavelengths, its bulk phonon-polariton band introduces a strong reflection peak inside the atmospheric transparency window (8-13 µm) which is detrimental to its selective emissivity. Herein, we demonstrate scalable strategies for the patterning of ordered and disordered SiO2 metasurfaces enhancing their thermal emissivity and enabling sub-ambient passive cooling under direct sunlight. |
| first_indexed | 2024-03-11T12:14:05Z |
| format | Article |
| id | doaj.art-be1422ddfd8e4ea199dd83acc23f8e89 |
| institution | Directory Open Access Journal |
| issn | 2100-014X |
| language | English |
| last_indexed | 2024-03-11T12:14:05Z |
| publishDate | 2023-01-01 |
| publisher | EDP Sciences |
| record_format | Article |
| series | EPJ Web of Conferences |
| spelling | doaj.art-be1422ddfd8e4ea199dd83acc23f8e892023-11-07T10:20:40ZengEDP SciencesEPJ Web of Conferences2100-014X2023-01-012870402610.1051/epjconf/202328704026epjconf_eosam2023_04026Patterning of SiO2 interfaces for radiative cooling applicationsZhenmin Ding0Jérémy Werlé1Xin Li2Hongbo Xu3Lei Pan4Yao Li5Lorenzo Pattelli6School of Chemistry and Chemical Engineering, Harbin Institute of TechnologyEuropean Laboratory for Non-linear Spectroscopy (LENS), University of FlorenceSchool of Chemistry and Chemical Engineering, Harbin Institute of TechnologySchool of Chemistry and Chemical Engineering, Harbin Institute of TechnologySchool of Chemistry and Chemical Engineering, Harbin Institute of TechnologyCenter for Composite Materials and Structure, Harbin Institute of TechnologyEuropean Laboratory for Non-linear Spectroscopy (LENS), University of FlorenceSilicon dioxide (SiO2) is a prominent material for radiative cooling applications due to its negligible absorption at solar wavelengths (0.25-2.5 µm) and exceptional stability. However, at thermal infrared wavelengths, its bulk phonon-polariton band introduces a strong reflection peak inside the atmospheric transparency window (8-13 µm) which is detrimental to its selective emissivity. Herein, we demonstrate scalable strategies for the patterning of ordered and disordered SiO2 metasurfaces enhancing their thermal emissivity and enabling sub-ambient passive cooling under direct sunlight.https://www.epj-conferences.org/articles/epjconf/pdf/2023/13/epjconf_eosam2023_04026.pdf |
| spellingShingle | Zhenmin Ding Jérémy Werlé Xin Li Hongbo Xu Lei Pan Yao Li Lorenzo Pattelli Patterning of SiO2 interfaces for radiative cooling applications EPJ Web of Conferences |
| title | Patterning of SiO2 interfaces for radiative cooling applications |
| title_full | Patterning of SiO2 interfaces for radiative cooling applications |
| title_fullStr | Patterning of SiO2 interfaces for radiative cooling applications |
| title_full_unstemmed | Patterning of SiO2 interfaces for radiative cooling applications |
| title_short | Patterning of SiO2 interfaces for radiative cooling applications |
| title_sort | patterning of sio2 interfaces for radiative cooling applications |
| url | https://www.epj-conferences.org/articles/epjconf/pdf/2023/13/epjconf_eosam2023_04026.pdf |
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