A controllable IC-compatible thin-film fuse realized using electro-explosion
A controllable IC-compatible thin-film fuse was developed that had Al/SiO2 thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows w...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2016-01-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4941074 |
| Summary: | A controllable IC-compatible thin-film fuse was developed that had Al/SiO2 thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows within 400 ns at 10 V. It can be used for small electronic elements as well as electropyrotechnic initiators to improve the no-firing current. |
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| ISSN: | 2158-3226 |