Steep Switching of In0.18Al0.82N/AlN/GaN MIS-HEMT (Metal Insulator Semiconductor High Electron Mobility Transistors) on Si for Sensor Applications †
InAlN/Al/GaN high electron mobility transistors (HEMTs) directly on Si with dynamic threshold voltage for steep subthreshold slope (<60 mV/dec) are demonstrated in this study, and attributed to displacement charge transition effects. The material analysis with High-Resolution X-ray Diffractio...
Main Authors: | Pin-Guang Chen, Kuan-Ting Chen, Ming Tang, Zheng-Ying Wang, Yu-Chen Chou, Min-Hung Lee |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2018-08-01
|
Series: | Sensors |
Subjects: | |
Online Access: | http://www.mdpi.com/1424-8220/18/9/2795 |
Similar Items
-
The Sensing Mechanism of InAlN/GaN HEMT
by: Yanli Liu, et al.
Published: (2022-03-01) -
Al<sub>2</sub>O<sub>3</sub>-Dielectric In<sub>0.18</sub>Al<sub>0.82</sub>N/AlN/GaN/Si Metal-Oxide-Semiconductor Heterostructure Field-Effect Transistors With Backside Substrate Metal-Trench Structure
by: Ching-Sung Lee, et al.
Published: (2018-01-01) -
Temperature dependent characteristics of InAlN/GaN HEMTs for mm-wave applications
by: Xing, Weichuan, et al.
Published: (2018) -
InAlN/GaN HEMT With n<sup>+</sup>GaN Contact Ledge Structure for Millimeter-Wave Low Voltage Applications
by: Can Gong, et al.
Published: (2023-01-01) -
Asymmetric GaN High Electron Mobility Transistors Design with InAlN Barrier at Source Side and AlGaN Barrier at Drain Side
by: Beibei Lv, et al.
Published: (2024-02-01)