Superhard oxidation-resistant Ti1-xAlxBy thin films grown by hybrid HiPIMS/DCMS co-sputtering diboride targets without external substrate heating

Superhard oxidation-resistant Ti1-xAlxBy thin films grown by hybrid HiPIMS/DCMS co-sputtering diboride targets without external substrate heating

Ti1-xAlxBy films (0.40 ≤ x ≤ 0.76, and 1.81 ≤ y ≤ 2.03) combining good mechanical properties and high-temperature oxidation resistance are demonstrated. Layers are grown using a hybrid high-power impulse and dc magnetron co-sputtering employing two target configurations (AlB2-HiPIMS/TiB2-DCMS and Ti...

Full description

Bibliographic Details
Main Authors: B. Wicher, O.V. Pshyk, X. Li, B. Bakhit, V. Rogoz, I. Petrov, L. Hultman, G. Greczynski
Format: Article
Language:English
Published: Elsevier 2024-02-01
Series:Materials & Design
Subjects:
Transition metal diboride thin films
Mechanical properties
Oxidation resistance
Magnetron sputtering
HiPIMS
Ion mass spectrometry
Online Access:http://www.sciencedirect.com/science/article/pii/S0264127524000996

Similar Items

Similar Items