An open source three-mirror laser scanning holographic two-photon lithography system.

Two-photon polymerization is a widely adopted technique for direct fabrication of 3D and 2D structures with sub-diffraction-limit features. Here we present an open-hardware, open-software custom design for a holographic multibeam two-photon polymerization system based on a phase-only spatial light m...

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Main Authors: Marco Pisanello, Di Zheng, Antonio Balena, Filippo Pisano, Massimo De Vittorio, Ferruccio Pisanello
Format: Article
Language:English
Published: Public Library of Science (PLoS) 2022-01-01
Series:PLoS ONE
Online Access:https://doi.org/10.1371/journal.pone.0265678
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author Marco Pisanello
Di Zheng
Antonio Balena
Filippo Pisano
Massimo De Vittorio
Ferruccio Pisanello
author_facet Marco Pisanello
Di Zheng
Antonio Balena
Filippo Pisano
Massimo De Vittorio
Ferruccio Pisanello
author_sort Marco Pisanello
collection DOAJ
description Two-photon polymerization is a widely adopted technique for direct fabrication of 3D and 2D structures with sub-diffraction-limit features. Here we present an open-hardware, open-software custom design for a holographic multibeam two-photon polymerization system based on a phase-only spatial light modulator and a three-mirror scanhead. The use of three reflective surfaces, two of which scanning the phase-modulated image along the same axis, allows to overcome the loss of virtual conjugation within the large galvanometric mirrors pair needed to accommodate the holographic projection. This extends the writing field of view among which the hologram can be employed for multi-beam two-photon polymerization by a factor of ~2 on one axis (i.e. from ~200μm to ~400μm), with a voxel size of ~250nm × ~1050nm (lateral × axial size), and writing speed of three simultaneous beams of 2000 voxels/s, making our system a powerful and reliable tool for advanced micro and nano-fabrications on large area.
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spelling doaj.art-c174896763b94c079d59fa724c41f3612022-12-22T01:53:37ZengPublic Library of Science (PLoS)PLoS ONE1932-62032022-01-01174e026567810.1371/journal.pone.0265678An open source three-mirror laser scanning holographic two-photon lithography system.Marco PisanelloDi ZhengAntonio BalenaFilippo PisanoMassimo De VittorioFerruccio PisanelloTwo-photon polymerization is a widely adopted technique for direct fabrication of 3D and 2D structures with sub-diffraction-limit features. Here we present an open-hardware, open-software custom design for a holographic multibeam two-photon polymerization system based on a phase-only spatial light modulator and a three-mirror scanhead. The use of three reflective surfaces, two of which scanning the phase-modulated image along the same axis, allows to overcome the loss of virtual conjugation within the large galvanometric mirrors pair needed to accommodate the holographic projection. This extends the writing field of view among which the hologram can be employed for multi-beam two-photon polymerization by a factor of ~2 on one axis (i.e. from ~200μm to ~400μm), with a voxel size of ~250nm × ~1050nm (lateral × axial size), and writing speed of three simultaneous beams of 2000 voxels/s, making our system a powerful and reliable tool for advanced micro and nano-fabrications on large area.https://doi.org/10.1371/journal.pone.0265678
spellingShingle Marco Pisanello
Di Zheng
Antonio Balena
Filippo Pisano
Massimo De Vittorio
Ferruccio Pisanello
An open source three-mirror laser scanning holographic two-photon lithography system.
PLoS ONE
title An open source three-mirror laser scanning holographic two-photon lithography system.
title_full An open source three-mirror laser scanning holographic two-photon lithography system.
title_fullStr An open source three-mirror laser scanning holographic two-photon lithography system.
title_full_unstemmed An open source three-mirror laser scanning holographic two-photon lithography system.
title_short An open source three-mirror laser scanning holographic two-photon lithography system.
title_sort open source three mirror laser scanning holographic two photon lithography system
url https://doi.org/10.1371/journal.pone.0265678
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