Increased Photoelectrochemical Performance of Vanadium Oxide Thin Film by Helium Plasma Treatment with Auxiliary Molybdenum Deposition

Increased Photoelectrochemical Performance of Vanadium Oxide Thin Film by Helium Plasma Treatment with Auxiliary Molybdenum Deposition

Helium (He) plasma treatment can be a versatile tool to fabricate nanostructures on a surface and change the surface chemistry. Herein, vanadium (V) thin film is exposed to helium plasmas and the changes in morphology and surface properties are investigated. The irradiation condition at which the su...

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Bibliographic Details
Main Authors: Shin Kajita, Tomoki Eda, Shuangyuan Feng, Hirohiko Tanaka, Anja Bieberle-Hütter, Noriyasu Ohno
Format: Article
Language:English
Published: Wiley-VCH 2023-03-01
Series:Advanced Energy & Sustainability Research
Subjects:
fuzz
helium plasma
nanostructures
photoelectrochemical performances
vanadium
Online Access:https://doi.org/10.1002/aesr.202200141

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