Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications
Nanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopor...
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| Format: | Article |
| Language: | English |
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MDPI AG
2021-12-01
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| Series: | Applied Sciences |
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| Online Access: | https://www.mdpi.com/2076-3417/11/24/12136 |
| _version_ | 1797506685633298432 |
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| author | Hongsub Jee Kiseok Jeon Min-Joon Park Jaehyeong Lee |
| author_facet | Hongsub Jee Kiseok Jeon Min-Joon Park Jaehyeong Lee |
| author_sort | Hongsub Jee |
| collection | DOAJ |
| description | Nanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopores fabrication by direct writing. However, direct writing is a rather expensive and time-consuming method due to its serial nature. Therefore, it may not translate to a preferred manufacturing process. In this research, a perfectly ordered large-area periodic pattern in an area of approximately 1 cm<sup>2</sup> has been successfully fabricated on various substrates including glass, silicon, and polydimethylsiloxane, using a two-step process comprising visible light-based multibeam interference lithography and subsequent pattern transfer processes of reactive ion etching and nanomolding. Additionally, the multibeam interference lithography templated anodized aluminum oxide process has been described. Since the fabrication area in multibeam interference lithography can be extended by using a larger beam size, it is highly cost effective and manufacturable. Furthermore, although not described here, an electrodeposition process can be utilized as a pattern transfer process. This large-area perfectly ordered nanopore array will be very useful for high-density electronic memory and photonic bandgap and metamaterial applications. |
| first_indexed | 2024-03-10T04:37:00Z |
| format | Article |
| id | doaj.art-c39b77d0d7ae42faa988f5ffcbe472b5 |
| institution | Directory Open Access Journal |
| issn | 2076-3417 |
| language | English |
| last_indexed | 2024-03-10T04:37:00Z |
| publishDate | 2021-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Applied Sciences |
| spelling | doaj.art-c39b77d0d7ae42faa988f5ffcbe472b52023-11-23T03:43:44ZengMDPI AGApplied Sciences2076-34172021-12-0111241213610.3390/app112412136Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic ApplicationsHongsub Jee0Kiseok Jeon1Min-Joon Park2Jaehyeong Lee3Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, KoreaSmart Energy & Nano R&D Group, Korea Institute of Industrial Technology, Gwangju 61012, KoreaSmart Energy & Nano R&D Group, Korea Institute of Industrial Technology, Gwangju 61012, KoreaDepartment of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, KoreaNanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopores fabrication by direct writing. However, direct writing is a rather expensive and time-consuming method due to its serial nature. Therefore, it may not translate to a preferred manufacturing process. In this research, a perfectly ordered large-area periodic pattern in an area of approximately 1 cm<sup>2</sup> has been successfully fabricated on various substrates including glass, silicon, and polydimethylsiloxane, using a two-step process comprising visible light-based multibeam interference lithography and subsequent pattern transfer processes of reactive ion etching and nanomolding. Additionally, the multibeam interference lithography templated anodized aluminum oxide process has been described. Since the fabrication area in multibeam interference lithography can be extended by using a larger beam size, it is highly cost effective and manufacturable. Furthermore, although not described here, an electrodeposition process can be utilized as a pattern transfer process. This large-area perfectly ordered nanopore array will be very useful for high-density electronic memory and photonic bandgap and metamaterial applications.https://www.mdpi.com/2076-3417/11/24/12136multibeam interference lithography (MIL)reactive ion etching (RIE)large areananoporetransferpattern |
| spellingShingle | Hongsub Jee Kiseok Jeon Min-Joon Park Jaehyeong Lee Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications Applied Sciences multibeam interference lithography (MIL) reactive ion etching (RIE) large area nanopore transfer pattern |
| title | Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications |
| title_full | Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications |
| title_fullStr | Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications |
| title_full_unstemmed | Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications |
| title_short | Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications |
| title_sort | fabrication of large area ordered nanoporous structures on various substrates for potential electro optic applications |
| topic | multibeam interference lithography (MIL) reactive ion etching (RIE) large area nanopore transfer pattern |
| url | https://www.mdpi.com/2076-3417/11/24/12136 |
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