Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications
Nanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopor...
Main Authors: | Hongsub Jee, Kiseok Jeon, Min-Joon Park, Jaehyeong Lee |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2021-12-01
|
Series: | Applied Sciences |
Subjects: | |
Online Access: | https://www.mdpi.com/2076-3417/11/24/12136 |
Similar Items
-
Combining Interference Lithography and Two-Photon Lithography for Fabricating Large-Area Photonic Crystal Structures with Controlled Defects
by: Hongsub Jee, et al.
Published: (2021-07-01) -
Optimization of etching processes for the fabrication of smooth silicon carbide membranes for applications in quantum technology
by: Mahsa Mokhtarzadeh, et al.
Published: (2022-08-01) -
Fabrication and Characterization of Plasmonic Nanopores with Cavities in the Solid Support
by: Bita Malekian, et al.
Published: (2017-06-01) -
Effect of Various Wafer Surface Etching Processes on c-Si Solar Cell Characteristics
by: Jeong Eun Park, et al.
Published: (2021-07-01) -
Generic characterization method for nano-gratings using deep-neural-network-assisted ellipsometry
by: Jiang Zijie, et al.
Published: (2024-01-01)