Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes
A new data dimension-reduction method, called Internal Information Redundancy Reduction (IIRR), is proposed for application to Optical Emission Spectroscopy (OES) datasets obtained from industrial plasma processes. For example in a semiconductor manufacturing environment, real-time spectral emission...
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MDPI AG
2013-12-01
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| Series: | Sensors |
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| Online Access: | http://www.mdpi.com/1424-8220/14/1/52 |
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| author | Jie Yang Conor McArdle Stephen Daniels |
| author_facet | Jie Yang Conor McArdle Stephen Daniels |
| author_sort | Jie Yang |
| collection | DOAJ |
| description | A new data dimension-reduction method, called Internal Information Redundancy Reduction (IIRR), is proposed for application to Optical Emission Spectroscopy (OES) datasets obtained from industrial plasma processes. For example in a semiconductor manufacturing environment, real-time spectral emission data is potentially very useful for inferring information about critical process parameters such as wafer etch rates, however, the relationship between the spectral sensor data gathered over the duration of an etching process step and the target process output parameters is complex. OES sensor data has high dimensionality (fine wavelength resolution is required in spectral emission measurements in order to capture data on all chemical species involved in plasma reactions) and full spectrum samples are taken at frequent time points, so that dynamic process changes can be captured. To maximise the utility of the gathered dataset, it is essential that information redundancy is minimised, but with the important requirement that the resulting reduced dataset remains in a form that is amenable to direct interpretation of the physical process. To meet this requirement and to achieve a high reduction in dimension with little information loss, the IIRR method proposed in this paper operates directly in the original variable space, identifying peak wavelength emissions and the correlative relationships between them. A new statistic, Mean Determination Ratio (MDR), is proposed to quantify the information loss after dimension reduction and the effectiveness of IIRR is demonstrated using an actual semiconductor manufacturing dataset. As an example of the application of IIRR in process monitoring/control, we also show how etch rates can be accurately predicted from IIRR dimension-reduced spectral data. |
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| last_indexed | 2024-04-11T12:12:10Z |
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| spelling | doaj.art-c3a55f14b4a046e597d8aff9101bf6152022-12-22T04:24:34ZengMDPI AGSensors1424-82202013-12-01141526710.3390/s140100052s140100052Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma ProcessesJie Yang0Conor McArdle1Stephen Daniels2Energy Design Lab, Faculty of Engineering and Computing, Dublin City University, Glasnevin, Dublin 9, IrelandEnergy Design Lab, Faculty of Engineering and Computing, Dublin City University, Glasnevin, Dublin 9, IrelandEnergy Design Lab, Faculty of Engineering and Computing, Dublin City University, Glasnevin, Dublin 9, IrelandA new data dimension-reduction method, called Internal Information Redundancy Reduction (IIRR), is proposed for application to Optical Emission Spectroscopy (OES) datasets obtained from industrial plasma processes. For example in a semiconductor manufacturing environment, real-time spectral emission data is potentially very useful for inferring information about critical process parameters such as wafer etch rates, however, the relationship between the spectral sensor data gathered over the duration of an etching process step and the target process output parameters is complex. OES sensor data has high dimensionality (fine wavelength resolution is required in spectral emission measurements in order to capture data on all chemical species involved in plasma reactions) and full spectrum samples are taken at frequent time points, so that dynamic process changes can be captured. To maximise the utility of the gathered dataset, it is essential that information redundancy is minimised, but with the important requirement that the resulting reduced dataset remains in a form that is amenable to direct interpretation of the physical process. To meet this requirement and to achieve a high reduction in dimension with little information loss, the IIRR method proposed in this paper operates directly in the original variable space, identifying peak wavelength emissions and the correlative relationships between them. A new statistic, Mean Determination Ratio (MDR), is proposed to quantify the information loss after dimension reduction and the effectiveness of IIRR is demonstrated using an actual semiconductor manufacturing dataset. As an example of the application of IIRR in process monitoring/control, we also show how etch rates can be accurately predicted from IIRR dimension-reduced spectral data.http://www.mdpi.com/1424-8220/14/1/52dimension reductionOESplasma etching processOES output pattern |
| spellingShingle | Jie Yang Conor McArdle Stephen Daniels Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes Sensors dimension reduction OES plasma etching process OES output pattern |
| title | Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes |
| title_full | Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes |
| title_fullStr | Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes |
| title_full_unstemmed | Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes |
| title_short | Dimension Reduction of Multivariable Optical Emission Spectrometer Datasets for Industrial Plasma Processes |
| title_sort | dimension reduction of multivariable optical emission spectrometer datasets for industrial plasma processes |
| topic | dimension reduction OES plasma etching process OES output pattern |
| url | http://www.mdpi.com/1424-8220/14/1/52 |
| work_keys_str_mv | AT jieyang dimensionreductionofmultivariableopticalemissionspectrometerdatasetsforindustrialplasmaprocesses AT conormcardle dimensionreductionofmultivariableopticalemissionspectrometerdatasetsforindustrialplasmaprocesses AT stephendaniels dimensionreductionofmultivariableopticalemissionspectrometerdatasetsforindustrialplasmaprocesses |