Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques
This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were emp...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-01-01
|
| Series: | Materials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/1996-1944/14/2/274 |
| _version_ | 1797415053495894016 |
|---|---|
| author | Shih-Jyun Shen Demei Lee Yu-Chen Wu Shih-Jung Liu |
| author_facet | Shih-Jyun Shen Demei Lee Yu-Chen Wu Shih-Jung Liu |
| author_sort | Shih-Jyun Shen |
| collection | DOAJ |
| description | This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes. |
| first_indexed | 2024-03-09T05:42:30Z |
| format | Article |
| id | doaj.art-c4cc7fe74852449bbed4648437cd991d |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-03-09T05:42:30Z |
| publishDate | 2021-01-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Materials |
| spelling | doaj.art-c4cc7fe74852449bbed4648437cd991d2023-12-03T12:24:13ZengMDPI AGMaterials1996-19442021-01-0114227410.3390/ma14020274Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating TechniquesShih-Jyun Shen0Demei Lee1Yu-Chen Wu2Shih-Jung Liu3Department of Mechanical Engineering, Chang Gung University, Taoyuan 33302, TaiwanDepartment of Mechanical Engineering, Chang Gung University, Taoyuan 33302, TaiwanDepartment of Mechanical Engineering, Chang Gung University, Taoyuan 33302, TaiwanDepartment of Mechanical Engineering, Chang Gung University, Taoyuan 33302, TaiwanThis paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes.https://www.mdpi.com/1996-1944/14/2/274binary colloidal arraypolystyrene nanospherespin coatingconcurrent and sequential coatingprocess optimization |
| spellingShingle | Shih-Jyun Shen Demei Lee Yu-Chen Wu Shih-Jung Liu Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques Materials binary colloidal array polystyrene nanosphere spin coating concurrent and sequential coating process optimization |
| title | Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques |
| title_full | Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques |
| title_fullStr | Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques |
| title_full_unstemmed | Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques |
| title_short | Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques |
| title_sort | binary self assembly of nanocolloidal arrays using concurrent and sequential spin coating techniques |
| topic | binary colloidal array polystyrene nanosphere spin coating concurrent and sequential coating process optimization |
| url | https://www.mdpi.com/1996-1944/14/2/274 |
| work_keys_str_mv | AT shihjyunshen binaryselfassemblyofnanocolloidalarraysusingconcurrentandsequentialspincoatingtechniques AT demeilee binaryselfassemblyofnanocolloidalarraysusingconcurrentandsequentialspincoatingtechniques AT yuchenwu binaryselfassemblyofnanocolloidalarraysusingconcurrentandsequentialspincoatingtechniques AT shihjungliu binaryselfassemblyofnanocolloidalarraysusingconcurrentandsequentialspincoatingtechniques |