N-Graphene Nanowalls via Plasma Nitrogen Incorporation and Substitution: The Experimental Evidence
Abstract Incorporating nitrogen (N) atom in graphene is considered a key technique for tuning its electrical properties. However, this is still a great challenge, and it is unclear how to build N-graphene with desired nitrogen configurations. There is a lack of experimental evidence to explain the i...
Main Authors: | Neelakandan M. Santhosh, Gregor Filipič, Eva Kovacevic, Andrea Jagodar, Johannes Berndt, Thomas Strunskus, Hiroki Kondo, Masaru Hori, Elena Tatarova, Uroš Cvelbar |
---|---|
Format: | Article |
Language: | English |
Published: |
SpringerOpen
2020-02-01
|
Series: | Nano-Micro Letters |
Subjects: | |
Online Access: | http://link.springer.com/article/10.1007/s40820-020-0395-5 |
Similar Items
-
Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges
by: Neelakandan M. Santhosh, et al.
Published: (2018-11-01) -
Correlating Disorder Microstructure and Magnetotransport of Carbon Nanowalls
by: Mijaela Acosta Gentoiu, et al.
Published: (2023-02-01) -
High Voltage Graphene Nanowall Trench MOS Barrier Schottky Diode Characterization for High Temperature Applications
by: Rahimah Mohd Saman, et al.
Published: (2019-04-01) -
Advancements in Plasma-Enhanced Chemical Vapor Deposition for Producing Vertical Graphene Nanowalls
by: Enric Bertran-Serra, et al.
Published: (2023-09-01) -
Anomalous temperature coefficient of resistance in graphene nanowalls/polymer films and applications in infrared photodetectors
by: Zhang Hui, et al.
Published: (2018-05-01)