Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments

Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments

Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) chemically modified by electron beam (EB) irradiation, which is composed of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT). Irradiating a NPHT by EB could successfully induce the orientation and selective patterning of block...

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Bibliographic Details
Main Authors: Hiroki Yamamoto, Guy Dawson, Takahiro Kozawa, Alex P. G. Robinson
Format: Article
Language:English
Published: MDPI AG 2020-03-01
Series:Quantum Beam Science
Subjects:
electron beam
directed self-assembly
block copolymer
self-assembled monolayers
lithography
polystyrene-<i>block</i>-poly(methyl methacrylate)
Online Access:https://www.mdpi.com/2412-382X/4/2/19

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