Dataset on large area nano-crystalline graphite film (NCG) grown on SiO2 using plasma-enhanced chemical vapour deposition
A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO2) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron (S...
Main Authors: | Camelia Albu, Sandra A.V. Eremia, Monica Lucia Veca, Andrei Avram, Radu Cristian Popa, Cristina Pachiu, Cosmin Romanitan, Mihaela Kusko, Raluca Gavrila, Antonio Radoi |
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Format: | Article |
Language: | English |
Published: |
Elsevier
2019-06-01
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Series: | Data in Brief |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2352340919302744 |
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