Impact of hydrogenation on the stability and mechanical properties of amorphous boron nitride

Interconnect materials with ultralow dielectric constant, and good thermal and mechanical properties are crucial for the further miniaturization of electronic devices. Recently, it has been demonstrated that ultrathin amorphous boron nitride (aBN) films have a very low dielectric constant, high dens...

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Bibliographic Details
Main Authors: Onurcan Kaya, Luigi Colombo, Aleandro Antidormi, Marco A Villena, Mario Lanza, Ivan Cole, Stephan Roche
Format: Article
Language:English
Published: IOP Publishing 2024-01-01
Series:JPhys Materials
Subjects:
Online Access:https://doi.org/10.1088/2515-7639/ad367b