Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis
A 2.45 GHz microwave-plasma chemical-vapor deposition (MPCVD) reactor was designed and built in-house by collaborating with Guangdong TrueOne Semiconductor Technology Co., Ltd. A cylindrical cavity was designed as the deposition chamber and a circumferential coaxial-mode transformer located at the t...
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MDPI AG
2019-06-01
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author | Qijun Wang Gai Wu Sheng Liu Zhiyin Gan Bo Yang Junheng Pan |
author_facet | Qijun Wang Gai Wu Sheng Liu Zhiyin Gan Bo Yang Junheng Pan |
author_sort | Qijun Wang |
collection | DOAJ |
description | A 2.45 GHz microwave-plasma chemical-vapor deposition (MPCVD) reactor was designed and built in-house by collaborating with Guangdong TrueOne Semiconductor Technology Co., Ltd. A cylindrical cavity was designed as the deposition chamber and a circumferential coaxial-mode transformer located at the top of the cavity was adopted as the antenna. Two quartz-ring windows that were placed far away from the plasma and cooled by water-cooling cavity walls were used to affix the antenna to the cavity and act as a vacuum seal for the reactor, respectively. This design improved the sealing and protected the quartz windows. In addition, a numerical simulation was proposed to predict the electric-field and plasma-density distributions in the cavity. Based on the simulation results, a microwave-plasma reactor with TM<sub>021</sub> mode was built. The leak rate of this new reactor was tested to be as low as 1 × 10<sup>−8</sup> Pa·m<sup>3</sup>·s<sup>−1</sup>, and the maximal microwave power was as high as 10 kW. Then, single-crystal diamond films were grown with the morphology and crystalline quality characterized by an optical microscope, atomic force microscope (AFM), Raman spectrometer, photoluminescence (PL) spectrometer, and high-resolution X-ray diffractometer. It was shown that the newly developed MPCVD reactor can produce diamond films with high quality and purity. |
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spelling | doaj.art-c85b1be1510c4eb79b0459b30bd010cb2022-12-22T01:56:43ZengMDPI AGCrystals2073-43522019-06-019632010.3390/cryst9060320cryst9060320Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film SynthesisQijun Wang0Gai Wu1Sheng Liu2Zhiyin Gan3Bo Yang4Junheng Pan5The Laboratory of Transients in Hydraulic Machinery, School of Power and Mechanical Engineering, Wuhan University, Wuhan 430072, ChinaThe Laboratory of Transients in Hydraulic Machinery, School of Power and Mechanical Engineering, Wuhan University, Wuhan 430072, ChinaThe Laboratory of Transients in Hydraulic Machinery, School of Power and Mechanical Engineering, Wuhan University, Wuhan 430072, ChinaSchool of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, ChinaSchool of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, ChinaThe Laboratory of Transients in Hydraulic Machinery, School of Power and Mechanical Engineering, Wuhan University, Wuhan 430072, ChinaA 2.45 GHz microwave-plasma chemical-vapor deposition (MPCVD) reactor was designed and built in-house by collaborating with Guangdong TrueOne Semiconductor Technology Co., Ltd. A cylindrical cavity was designed as the deposition chamber and a circumferential coaxial-mode transformer located at the top of the cavity was adopted as the antenna. Two quartz-ring windows that were placed far away from the plasma and cooled by water-cooling cavity walls were used to affix the antenna to the cavity and act as a vacuum seal for the reactor, respectively. This design improved the sealing and protected the quartz windows. In addition, a numerical simulation was proposed to predict the electric-field and plasma-density distributions in the cavity. Based on the simulation results, a microwave-plasma reactor with TM<sub>021</sub> mode was built. The leak rate of this new reactor was tested to be as low as 1 × 10<sup>−8</sup> Pa·m<sup>3</sup>·s<sup>−1</sup>, and the maximal microwave power was as high as 10 kW. Then, single-crystal diamond films were grown with the morphology and crystalline quality characterized by an optical microscope, atomic force microscope (AFM), Raman spectrometer, photoluminescence (PL) spectrometer, and high-resolution X-ray diffractometer. It was shown that the newly developed MPCVD reactor can produce diamond films with high quality and purity.https://www.mdpi.com/2073-4352/9/6/320microwave-plasma chemical-vapor deposition (MPCVD)cylindrical cavitydiamond films |
spellingShingle | Qijun Wang Gai Wu Sheng Liu Zhiyin Gan Bo Yang Junheng Pan Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis Crystals microwave-plasma chemical-vapor deposition (MPCVD) cylindrical cavity diamond films |
title | Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis |
title_full | Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis |
title_fullStr | Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis |
title_full_unstemmed | Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis |
title_short | Simulation-Based Development of a New Cylindrical-Cavity Microwave-Plasma Reactor for Diamond-Film Synthesis |
title_sort | simulation based development of a new cylindrical cavity microwave plasma reactor for diamond film synthesis |
topic | microwave-plasma chemical-vapor deposition (MPCVD) cylindrical cavity diamond films |
url | https://www.mdpi.com/2073-4352/9/6/320 |
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