Contrast Analysis of Polarization in Three-Beam Interference Lithography

Contrast Analysis of Polarization in Three-Beam Interference Lithography

This paper analyzes the effect of polarization and the incident angle on the contrasts of interference patterns in three-beam interference lithography. A non-coplanar laser interference system was set up to simulate the relationship between contrast, beam polarization, and the incident angle. Differ...

Full description

Bibliographic Details
Main Authors: Fuping Peng, Jing Du, Jialin Du, Simo Wang, Wei Yan
Format: Article
Language:English
Published: MDPI AG 2021-05-01
Series:Applied Sciences
Subjects:
pattern contrast
polarization
incident angle
interference lithography
Online Access:https://www.mdpi.com/2076-3417/11/11/4789

Similar Items

Similar Items