Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved...
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| Format: | Article |
| Language: | English |
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MDPI AG
2020-06-01
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| Series: | Micromachines |
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| Online Access: | https://www.mdpi.com/2072-666X/11/6/589 |
| _version_ | 1797565455794176000 |
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| author | Lucia Romano Marco Stampanoni |
| author_facet | Lucia Romano Marco Stampanoni |
| author_sort | Lucia Romano |
| collection | DOAJ |
| description | High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal assisted chemical etching (MacEtch) is emerging as a new etching technique that allows huge aspect ratio for feature size in the nanoscale. To date, a specialized review of MacEtch that considers both the fundamentals and X-ray optics applications is missing in the literature. This review aims to provide a comprehensive summary including: (i) fundamental mechanism; (ii) basics and roles to perform uniform etching in direction perpendicular to the <100> Si substrate; (iii) several examples of X-ray optics fabricated by MacEtch such as line gratings, circular gratings array, Fresnel zone plates, and other X-ray lenses; (iv) materials and methods for a full fabrication of absorbing gratings and the application in X-ray grating based interferometry; and (v) future perspectives of X-ray optics fabrication. The review provides researchers and engineers with an extensive and updated understanding of the principles and applications of MacEtch as a new technology for X-ray optics fabrication. |
| first_indexed | 2024-03-10T19:13:26Z |
| format | Article |
| id | doaj.art-cb07fb7cbe714ab3876301a1778e5289 |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-10T19:13:26Z |
| publishDate | 2020-06-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Micromachines |
| spelling | doaj.art-cb07fb7cbe714ab3876301a1778e52892023-11-20T03:39:52ZengMDPI AGMicromachines2072-666X2020-06-0111658910.3390/mi11060589Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A ReviewLucia Romano0Marco Stampanoni1Institute for Biomedical Engineering, ETH Zürich, 8092 Zürich, SwitzerlandInstitute for Biomedical Engineering, ETH Zürich, 8092 Zürich, SwitzerlandHigh-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal assisted chemical etching (MacEtch) is emerging as a new etching technique that allows huge aspect ratio for feature size in the nanoscale. To date, a specialized review of MacEtch that considers both the fundamentals and X-ray optics applications is missing in the literature. This review aims to provide a comprehensive summary including: (i) fundamental mechanism; (ii) basics and roles to perform uniform etching in direction perpendicular to the <100> Si substrate; (iii) several examples of X-ray optics fabricated by MacEtch such as line gratings, circular gratings array, Fresnel zone plates, and other X-ray lenses; (iv) materials and methods for a full fabrication of absorbing gratings and the application in X-ray grating based interferometry; and (v) future perspectives of X-ray optics fabrication. The review provides researchers and engineers with an extensive and updated understanding of the principles and applications of MacEtch as a new technology for X-ray optics fabrication.https://www.mdpi.com/2072-666X/11/6/589X-ray grating interferometrycatalystsilicongold electroplating |
| spellingShingle | Lucia Romano Marco Stampanoni Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review Micromachines X-ray grating interferometry catalyst silicon gold electroplating |
| title | Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review |
| title_full | Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review |
| title_fullStr | Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review |
| title_full_unstemmed | Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review |
| title_short | Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review |
| title_sort | microfabrication of x ray optics by metal assisted chemical etching a review |
| topic | X-ray grating interferometry catalyst silicon gold electroplating |
| url | https://www.mdpi.com/2072-666X/11/6/589 |
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