Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved...
Main Authors: | Lucia Romano, Marco Stampanoni |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-06-01
|
Series: | Micromachines |
Subjects: | |
Online Access: | https://www.mdpi.com/2072-666X/11/6/589 |
Similar Items
-
Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching
by: Zhitian Shi, et al.
Published: (2020-09-01) -
Comparison of Thermal Neutron and Hard X-ray Dark-Field Tomography
by: Alex Gustschin, et al.
Published: (2020-12-01) -
Single-exposure X-ray phase imaging microscopy with a grating interferometer
by: Andreas Wolf, et al.
Published: (2022-05-01) -
Fabrication of X-ray Gratings for Interferometric Imaging by Conformal Seedless Gold Electroplating
by: Konstantins Jefimovs, et al.
Published: (2021-05-01) -
Recent Progress in X-ray and Neutron Phase Imaging with Gratings
by: Atsushi Momose, et al.
Published: (2020-02-01)