Future of the Nanoelectronics Technology

Since the advent of bipolar transistor at Bell AT&T laboratories, the constant development of electronics industry over the past six decades have pushed the size of active semiconductor devices to its boundaries. The Moore's law which dictated doubling speed and halving physical dimensi...

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Bibliographic Details
Main Authors: Mohammad Hasan Aram, Taha Rajabzadeh, Majid Aleizadeh, Sina Khorasani
Format: Article
Language:fas
Published: Iran Academy of Science 2017-12-01
Series:آموزش مهندسی ایران
Subjects:
Online Access:https://ijee.ias.ac.ir/article_55328.html?lang=en
Description
Summary:Since the advent of bipolar transistor at Bell AT&T laboratories, the constant development of electronics industry over the past six decades have pushed the size of active semiconductor devices to its boundaries. The Moore's law which dictated doubling speed and halving physical dimensions every 18 months is now facing its end pretty soon. Current commercial technology is now being limited to the atomic spacing on one hand, and power density on the other hand. Solar power as well as quantum computing are also another relevant areas which would need certain physical implementations and materials. In short, the moving force and economic power behind this industry is enormous, however, technological bottlenecks are real and showing themselves very clearly now. Directions which may ultimately alleviate these restrictions are not too many, including two-dimensional nano-electronics, memristive networks, spintronics, compound semiconductor devices, optoelectronics interconnects, just to mention a few. This talk will address two important paradigms in this area 1) What are the real challenges in this technology? 2) What are the roots of retardation in our country and what can be done to merge into the international efforts? I will try to plant seeds to resolve some of the most basic misunderstandings in our academia and redirect the technology investments into a much more fruitful direction, with hopes that the next generation of our experts will have a much wider and relaxed atmosphere to excel and prosper.
ISSN:1607-2316
2676-4881