Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor Deposition
In this work, we present the synthesis of thin films of TiO2 doped with cobalt using the MOCVD technique, allowing the growth of coatings with controlled morphology and a faster deposit speed, as compared to other techniques. In addition, the synthesis parameters necessary for the reproducibility of...
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| Format: | Article |
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Elsevier
2020-03-01
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| Series: | Results in Physics |
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| Online Access: | http://www.sciencedirect.com/science/article/pii/S2211379719309192 |
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| author | Néstor Méndez-Lozano Miguel Apátiga-Castro Alejandro Manzano-Ramírez Eric M. Rivera-Muñoz Rodrigo Velázquez-Castillo Carlos Alberto-González Marco Zamora-Antuñano |
| author_facet | Néstor Méndez-Lozano Miguel Apátiga-Castro Alejandro Manzano-Ramírez Eric M. Rivera-Muñoz Rodrigo Velázquez-Castillo Carlos Alberto-González Marco Zamora-Antuñano |
| author_sort | Néstor Méndez-Lozano |
| collection | DOAJ |
| description | In this work, we present the synthesis of thin films of TiO2 doped with cobalt using the MOCVD technique, allowing the growth of coatings with controlled morphology and a faster deposit speed, as compared to other techniques. In addition, the synthesis parameters necessary for the reproducibility of the films were obtained. Anatase thin films doped with cobalt were prepared by the Metal Organic Chemical Vapor Deposition technique working in pulsed injection mode using a mixture of titanium (IV) isopropoxide and acetyl acetonate of cobalt at different concentrations as the precursor. The films were deposited on silicon (1 0 0) substrates at temperature of 650 °C. The crystalline structure of the deposited films was characterized by X-ray diffraction (XRD) and Raman spectroscopy. The characteristic XRD peaks and vibrational modes of TiO2 corresponding to the anatase phase were observed in all cases, without any secondary or mixed phase. On the other hand, the scanning electron microscopy (SEM) observations show that the film surfaces are formed by a higher number of porous, which are characteristic of the anatase films and the corresponding Energy Dispersion Spectroscopy (EDS) shows the elemental composition. |
| first_indexed | 2024-12-21T05:10:08Z |
| format | Article |
| id | doaj.art-ce06cb776c8b4d31afee6cd25fd141a0 |
| institution | Directory Open Access Journal |
| issn | 2211-3797 |
| language | English |
| last_indexed | 2024-12-21T05:10:08Z |
| publishDate | 2020-03-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Results in Physics |
| spelling | doaj.art-ce06cb776c8b4d31afee6cd25fd141a02022-12-21T19:15:04ZengElsevierResults in Physics2211-37972020-03-0116102891Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor DepositionNéstor Méndez-Lozano0Miguel Apátiga-Castro1Alejandro Manzano-Ramírez2Eric M. Rivera-Muñoz3Rodrigo Velázquez-Castillo4Carlos Alberto-González5Marco Zamora-Antuñano6Universidad del Valle de México, Campus Querétaro, Blvd. Juriquilla No. 1000 A, Del. Santa Rosa Jáuregui, Querétaro, Qro C.P. 76230, Mexico; Corresponding author.Centro de Física Aplicada y Tecnología Avanzada, Universidad Nacional Autónoma de México, A.P. 1-1010, Querétaro, Qro C. P. 76000, MexicoCentro de Investigación y de Estudios Avanzados, Unidad Querétaro, Libramiento Norponiente # 2000. Fracc. Real de Juriquilla, Querétaro, Qro 76230, MexicoCentro de Física Aplicada y Tecnología Avanzada, Universidad Nacional Autónoma de México, A.P. 1-1010, Querétaro, Qro C. P. 76000, MexicoDivisión de Investigación y Posgrado, Universidad Autónoma de Querétaro, Cerro de las Campanas S/N, Querétaro, Qro C.P 76010, MexicoUniversidad del Valle de México, Campus Querétaro, Blvd. Juriquilla No. 1000 A, Del. Santa Rosa Jáuregui, Querétaro, Qro C.P. 76230, MexicoUniversidad del Valle de México, Campus Querétaro, Blvd. Juriquilla No. 1000 A, Del. Santa Rosa Jáuregui, Querétaro, Qro C.P. 76230, MexicoIn this work, we present the synthesis of thin films of TiO2 doped with cobalt using the MOCVD technique, allowing the growth of coatings with controlled morphology and a faster deposit speed, as compared to other techniques. In addition, the synthesis parameters necessary for the reproducibility of the films were obtained. Anatase thin films doped with cobalt were prepared by the Metal Organic Chemical Vapor Deposition technique working in pulsed injection mode using a mixture of titanium (IV) isopropoxide and acetyl acetonate of cobalt at different concentrations as the precursor. The films were deposited on silicon (1 0 0) substrates at temperature of 650 °C. The crystalline structure of the deposited films was characterized by X-ray diffraction (XRD) and Raman spectroscopy. The characteristic XRD peaks and vibrational modes of TiO2 corresponding to the anatase phase were observed in all cases, without any secondary or mixed phase. On the other hand, the scanning electron microscopy (SEM) observations show that the film surfaces are formed by a higher number of porous, which are characteristic of the anatase films and the corresponding Energy Dispersion Spectroscopy (EDS) shows the elemental composition.http://www.sciencedirect.com/science/article/pii/S2211379719309192Thin filmsAnatase filmsChemical vapor depositionNanostructure |
| spellingShingle | Néstor Méndez-Lozano Miguel Apátiga-Castro Alejandro Manzano-Ramírez Eric M. Rivera-Muñoz Rodrigo Velázquez-Castillo Carlos Alberto-González Marco Zamora-Antuñano Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor Deposition Results in Physics Thin films Anatase films Chemical vapor deposition Nanostructure |
| title | Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor Deposition |
| title_full | Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor Deposition |
| title_fullStr | Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor Deposition |
| title_full_unstemmed | Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor Deposition |
| title_short | Morphological study of TiO₂ thin films doped with cobalt by Metal Organic Chemical Vapor Deposition |
| title_sort | morphological study of tio₂ thin films doped with cobalt by metal organic chemical vapor deposition |
| topic | Thin films Anatase films Chemical vapor deposition Nanostructure |
| url | http://www.sciencedirect.com/science/article/pii/S2211379719309192 |
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