Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization

Chitosan is one of the promising compounds for use in various fields of medicine. However, for successful application, materials based on it must be insoluble in water and have specified physical and mechanical properties. In this work, we studied the interaction of <i>N</i>-methylolacry...

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Main Authors: Sergey Uspenskii, Vladislav Potseleev, Eugenia Svidchenko, Galina Goncharuk, Alexander Zelenetskii, Tatiana Akopova
Format: Article
Language:English
Published: MDPI AG 2022-12-01
Series:Polysaccharides
Subjects:
Online Access:https://www.mdpi.com/2673-4176/3/4/49
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author Sergey Uspenskii
Vladislav Potseleev
Eugenia Svidchenko
Galina Goncharuk
Alexander Zelenetskii
Tatiana Akopova
author_facet Sergey Uspenskii
Vladislav Potseleev
Eugenia Svidchenko
Galina Goncharuk
Alexander Zelenetskii
Tatiana Akopova
author_sort Sergey Uspenskii
collection DOAJ
description Chitosan is one of the promising compounds for use in various fields of medicine. However, for successful application, materials based on it must be insoluble in water and have specified physical and mechanical properties. In this work, we studied the interaction of <i>N</i>-methylolacrylamide (NMA) and chitosan upon concentration of the solutions, both under the action of UV radiation and without it, which results in curing of the polymer matrix. The main products, proposed mechanisms of the crosslinking reaction, and the influence of external conditions on these processes have been revealed using NMR, IR, and UV spectroscopy. It was found that the reaction proceeds along three pathways. The main reactions proceed with the amino groups of chitosan, and the hydroxymethyl and vinyl groups of NMA. Studies have shown that for the formation of insoluble materials based on chitosan, the best content in the initial cast solution is 2 wt% of chitosan at 0.25 wt% concentration of NMA. Films formed from such solutions possessed high strength and deformation characteristics, namely an elastic modulus of about 1500 GPa, a strength of about 30 MPa, and an elongation at break of about 100%.
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spelling doaj.art-cfafe1134bf3455393dfd34cf243188f2023-11-24T17:34:33ZengMDPI AGPolysaccharides2673-41762022-12-013483184310.3390/polysaccharides3040049Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and CharacterizationSergey Uspenskii0Vladislav Potseleev1Eugenia Svidchenko2Galina Goncharuk3Alexander Zelenetskii4Tatiana Akopova5Enikolopov Institute of Synthetic Polymeric Materials, Russian Academy of Sciences, 70, Profsoyuznaya Str., 117393 Moscow, RussiaFaculty of Chemistry, Moscow State University, 1, Leninskie Gory, 119991 Moscow, RussiaEnikolopov Institute of Synthetic Polymeric Materials, Russian Academy of Sciences, 70, Profsoyuznaya Str., 117393 Moscow, RussiaEnikolopov Institute of Synthetic Polymeric Materials, Russian Academy of Sciences, 70, Profsoyuznaya Str., 117393 Moscow, RussiaEnikolopov Institute of Synthetic Polymeric Materials, Russian Academy of Sciences, 70, Profsoyuznaya Str., 117393 Moscow, RussiaEnikolopov Institute of Synthetic Polymeric Materials, Russian Academy of Sciences, 70, Profsoyuznaya Str., 117393 Moscow, RussiaChitosan is one of the promising compounds for use in various fields of medicine. However, for successful application, materials based on it must be insoluble in water and have specified physical and mechanical properties. In this work, we studied the interaction of <i>N</i>-methylolacrylamide (NMA) and chitosan upon concentration of the solutions, both under the action of UV radiation and without it, which results in curing of the polymer matrix. The main products, proposed mechanisms of the crosslinking reaction, and the influence of external conditions on these processes have been revealed using NMR, IR, and UV spectroscopy. It was found that the reaction proceeds along three pathways. The main reactions proceed with the amino groups of chitosan, and the hydroxymethyl and vinyl groups of NMA. Studies have shown that for the formation of insoluble materials based on chitosan, the best content in the initial cast solution is 2 wt% of chitosan at 0.25 wt% concentration of NMA. Films formed from such solutions possessed high strength and deformation characteristics, namely an elastic modulus of about 1500 GPa, a strength of about 30 MPa, and an elongation at break of about 100%.https://www.mdpi.com/2673-4176/3/4/49chitosan<i>N</i>-methylolacrylamidefilmsUV irradiationreaction mechanismstrength and deformation characteristics
spellingShingle Sergey Uspenskii
Vladislav Potseleev
Eugenia Svidchenko
Galina Goncharuk
Alexander Zelenetskii
Tatiana Akopova
Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization
Polysaccharides
chitosan
<i>N</i>-methylolacrylamide
films
UV irradiation
reaction mechanism
strength and deformation characteristics
title Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization
title_full Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization
title_fullStr Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization
title_full_unstemmed Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization
title_short Photo-Curing Chitosan-g-N-Methylolacrylamide Compositions: Synthesis and Characterization
title_sort photo curing chitosan g n methylolacrylamide compositions synthesis and characterization
topic chitosan
<i>N</i>-methylolacrylamide
films
UV irradiation
reaction mechanism
strength and deformation characteristics
url https://www.mdpi.com/2673-4176/3/4/49
work_keys_str_mv AT sergeyuspenskii photocuringchitosangnmethylolacrylamidecompositionssynthesisandcharacterization
AT vladislavpotseleev photocuringchitosangnmethylolacrylamidecompositionssynthesisandcharacterization
AT eugeniasvidchenko photocuringchitosangnmethylolacrylamidecompositionssynthesisandcharacterization
AT galinagoncharuk photocuringchitosangnmethylolacrylamidecompositionssynthesisandcharacterization
AT alexanderzelenetskii photocuringchitosangnmethylolacrylamidecompositionssynthesisandcharacterization
AT tatianaakopova photocuringchitosangnmethylolacrylamidecompositionssynthesisandcharacterization