Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate
Open pore mesoporous silica (MPS) thin films and channels were prepared on a substrate surface. The pore dimension, thickness and ordering of the MPS thin films were controlled by using different concentrations of the precursor and molecular weight of the pluronics. Spectroscopic and microscopic tec...
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| Format: | Article |
| Language: | English |
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MDPI AG
2022-06-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/12/13/2223 |
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| author | Tandra Ghoshal Atul Thorat Nadezda Prochukhan Michael A. Morris |
| author_facet | Tandra Ghoshal Atul Thorat Nadezda Prochukhan Michael A. Morris |
| author_sort | Tandra Ghoshal |
| collection | DOAJ |
| description | Open pore mesoporous silica (MPS) thin films and channels were prepared on a substrate surface. The pore dimension, thickness and ordering of the MPS thin films were controlled by using different concentrations of the precursor and molecular weight of the pluronics. Spectroscopic and microscopic techniques were utilized to determine the alignment and ordering of the pores. Further, MPS channels on a substrate surface were fabricated using commercial available lithographic etch masks followed by an inductively coupled plasma (ICP) etch. Attempts were made to shrink the channel dimension by using a block copolymer (BCP) hard mask methodology. In this regard, polystyrene-<i>b</i>-poly(ethylene oxide) (PS-<i>b</i>-PEO) block copolymer (BCP) thin film forming perpendicularly oriented PEO cylinders in a PS matrix after microphase separation through solvent annealing was used as a structural template. An insitu hard mask methodology was applied which selectively incorporate the metal ions into the PEO microdomains followed by UV/Ozone treatment to generate the iron oxide hard mask nanopatterns. The aspect ratio of the MPS nanochannels can be varied by altering etching time without altering their shape. The MPS nanochannels exhibited good coverage across the entire substrate and allowed direct access to the pore structures. |
| first_indexed | 2024-03-09T10:26:40Z |
| format | Article |
| id | doaj.art-cfe1421936764e84998daf94a9ec6e09 |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-09T10:26:40Z |
| publishDate | 2022-06-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-cfe1421936764e84998daf94a9ec6e092023-12-01T21:37:28ZengMDPI AGNanomaterials2079-49912022-06-011213222310.3390/nano12132223Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a SubstrateTandra Ghoshal0Atul Thorat1Nadezda Prochukhan2Michael A. Morris3School of Chemistry, AMBER and CRANN, Trinity College Dublin, D02 AK60 Dublin, IrelandSchool of Chemistry, AMBER and CRANN, Trinity College Dublin, D02 AK60 Dublin, IrelandSchool of Chemistry, AMBER and CRANN, Trinity College Dublin, D02 AK60 Dublin, IrelandSchool of Chemistry, AMBER and CRANN, Trinity College Dublin, D02 AK60 Dublin, IrelandOpen pore mesoporous silica (MPS) thin films and channels were prepared on a substrate surface. The pore dimension, thickness and ordering of the MPS thin films were controlled by using different concentrations of the precursor and molecular weight of the pluronics. Spectroscopic and microscopic techniques were utilized to determine the alignment and ordering of the pores. Further, MPS channels on a substrate surface were fabricated using commercial available lithographic etch masks followed by an inductively coupled plasma (ICP) etch. Attempts were made to shrink the channel dimension by using a block copolymer (BCP) hard mask methodology. In this regard, polystyrene-<i>b</i>-poly(ethylene oxide) (PS-<i>b</i>-PEO) block copolymer (BCP) thin film forming perpendicularly oriented PEO cylinders in a PS matrix after microphase separation through solvent annealing was used as a structural template. An insitu hard mask methodology was applied which selectively incorporate the metal ions into the PEO microdomains followed by UV/Ozone treatment to generate the iron oxide hard mask nanopatterns. The aspect ratio of the MPS nanochannels can be varied by altering etching time without altering their shape. The MPS nanochannels exhibited good coverage across the entire substrate and allowed direct access to the pore structures.https://www.mdpi.com/2079-4991/12/13/2223open mesoporessilica channelsblock copolymershard masketching |
| spellingShingle | Tandra Ghoshal Atul Thorat Nadezda Prochukhan Michael A. Morris Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate Nanomaterials open mesopores silica channels block copolymers hard mask etching |
| title | Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate |
| title_full | Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate |
| title_fullStr | Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate |
| title_full_unstemmed | Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate |
| title_short | Fabrication of Dimensional and Structural Controlled Open Pore, Mesoporous Silica Topographies on a Substrate |
| title_sort | fabrication of dimensional and structural controlled open pore mesoporous silica topographies on a substrate |
| topic | open mesopores silica channels block copolymers hard mask etching |
| url | https://www.mdpi.com/2079-4991/12/13/2223 |
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