Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical application
Boron doped diamond thin films were grown on titanium alloy substrates (Ti6Al4V) with 36 × 35 × 1.3 mm at 873-933 K at 6.5 × 10³ Pa during 8 h by hot filament CVD assisted technique. The boron source was obtained from a H2 line forced to pass through a bubbler containing B2O3 dissolved in methanol (...
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| Format: | Article |
| Language: | English |
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Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
2003-01-01
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| Series: | Materials Research |
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| Online Access: | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392003000100011 |
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| author | Alessandra V. Diniz Neidenêi G. Ferreira Evaldo J. Corat Vladimir J. Trava-Airoldi |
| author_facet | Alessandra V. Diniz Neidenêi G. Ferreira Evaldo J. Corat Vladimir J. Trava-Airoldi |
| author_sort | Alessandra V. Diniz |
| collection | DOAJ |
| description | Boron doped diamond thin films were grown on titanium alloy substrates (Ti6Al4V) with 36 × 35 × 1.3 mm at 873-933 K at 6.5 × 10³ Pa during 8 h by hot filament CVD assisted technique. The boron source was obtained from a H2 line forced to pass through a bubbler containing B2O3 dissolved in methanol (BC = 6000 ppm). The films were grown on both sides of perforated and non-perforated substrates. Emphasis for diamond growing on perforated substrates have been done in order to increase the active surface area and hereafter to promote an easier electrolyte flow for wastewater treatment. The electrode performance was determined by cyclic voltammetry measurements in KCl, KNO3, Na2SO4, HCl, HNO3 and H2SO4 solutions and the reversibility behavior of the Fe(CN)6(3-/4-) at the Ti6Al4V/Diamond electrode were studied. Also, Scaning Electron Microcopy and Raman Scattering Spectroscopy were used for morphology and diamond quality evaluation, respectively. |
| first_indexed | 2024-12-22T12:08:54Z |
| format | Article |
| id | doaj.art-d0b7c8681b3b43ca86c975b4fd10dfac |
| institution | Directory Open Access Journal |
| issn | 1516-1439 |
| language | English |
| last_indexed | 2024-12-22T12:08:54Z |
| publishDate | 2003-01-01 |
| publisher | Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) |
| record_format | Article |
| series | Materials Research |
| spelling | doaj.art-d0b7c8681b3b43ca86c975b4fd10dfac2022-12-21T18:26:21ZengAssociação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)Materials Research1516-14392003-01-0161576110.1590/S1516-14392003000100011Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical applicationAlessandra V. DinizNeidenêi G. FerreiraEvaldo J. CoratVladimir J. Trava-AiroldiBoron doped diamond thin films were grown on titanium alloy substrates (Ti6Al4V) with 36 × 35 × 1.3 mm at 873-933 K at 6.5 × 10³ Pa during 8 h by hot filament CVD assisted technique. The boron source was obtained from a H2 line forced to pass through a bubbler containing B2O3 dissolved in methanol (BC = 6000 ppm). The films were grown on both sides of perforated and non-perforated substrates. Emphasis for diamond growing on perforated substrates have been done in order to increase the active surface area and hereafter to promote an easier electrolyte flow for wastewater treatment. The electrode performance was determined by cyclic voltammetry measurements in KCl, KNO3, Na2SO4, HCl, HNO3 and H2SO4 solutions and the reversibility behavior of the Fe(CN)6(3-/4-) at the Ti6Al4V/Diamond electrode were studied. Also, Scaning Electron Microcopy and Raman Scattering Spectroscopy were used for morphology and diamond quality evaluation, respectively.http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392003000100011boron doped-diamondTi6Al4Velectrochemistry |
| spellingShingle | Alessandra V. Diniz Neidenêi G. Ferreira Evaldo J. Corat Vladimir J. Trava-Airoldi Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical application Materials Research boron doped-diamond Ti6Al4V electrochemistry |
| title | Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical application |
| title_full | Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical application |
| title_fullStr | Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical application |
| title_full_unstemmed | Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical application |
| title_short | Boron doped diamond thin films on large area Ti6Al4V substrates for electrochemical application |
| title_sort | boron doped diamond thin films on large area ti6al4v substrates for electrochemical application |
| topic | boron doped-diamond Ti6Al4V electrochemistry |
| url | http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392003000100011 |
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