Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine Removal
Abstract Graphene oxide (GO) with different oxidation degrees is prepared by a modified Hummers’ method varying KMnO4 amount from 0.5 to 6.0 g. X‐ray powder diffraction (XRPD), micro–Raman, thermogravimetric analysis, X‐ray photoeelectron spectroscopy, Boehm titrations, high–resolution transmission...
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
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Wiley-VCH
2023-07-01
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| Series: | Advanced Materials Interfaces |
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| Online Access: | https://doi.org/10.1002/admi.202300179 |
| _version_ | 1797771392519766016 |
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| author | Eleonora Pargoletti Marco Scavini Saveria Santangelo Giovanni Consolati Giuseppina Cerrato Martina Longoni Salvatore Patané Mariangela Longhi Giuseppe Cappelletti |
| author_facet | Eleonora Pargoletti Marco Scavini Saveria Santangelo Giovanni Consolati Giuseppina Cerrato Martina Longoni Salvatore Patané Mariangela Longhi Giuseppe Cappelletti |
| author_sort | Eleonora Pargoletti |
| collection | DOAJ |
| description | Abstract Graphene oxide (GO) with different oxidation degrees is prepared by a modified Hummers’ method varying KMnO4 amount from 0.5 to 6.0 g. X‐ray powder diffraction (XRPD), micro–Raman, thermogravimetric analysis, X‐ray photoeelectron spectroscopy, Boehm titrations, high–resolution transmission electron microscopy, and, finally, positron annihilation lifetime spectroscopy (PALS) are exploited to assess the properties of GO. Results show that increasing oxidant species can tune the interlayer gap between GO sheets up to a maximum value in the case of 4.0 g KMnO4 content. Moreover, these results validate the two‐component‐based model of GO in which, at low oxidation degree, there are unsplit/isolated graphene planes, instead at higher oxidant amounts, a five‐layer sandwiched configuration occurs comprising graphene planes having functional groups decorating the edges (bwGO), hydrated oxidative debris (OD) and “empty” spaces (revealed by PALS as the distance between (bwGO + OD) two‐component layers). In addition, by XRPD analysis, the total gap between two sheets is easily computed. In order to correlate these findings to pollutant removal capability, planar o‐toluidine adsorption is studied. Since this molecule diffuses in an aqueous environment, the obtained adsorption percentages are compared to the thickness of the hydrated OD grafted onto bwGO. A strict connection between the pollutant removal efficacy and the variation of the hydrated interlayer distance is found. |
| first_indexed | 2024-03-12T21:36:55Z |
| format | Article |
| id | doaj.art-d16732f0a495471c88f4529f14a59802 |
| institution | Directory Open Access Journal |
| issn | 2196-7350 |
| language | English |
| last_indexed | 2024-03-12T21:36:55Z |
| publishDate | 2023-07-01 |
| publisher | Wiley-VCH |
| record_format | Article |
| series | Advanced Materials Interfaces |
| spelling | doaj.art-d16732f0a495471c88f4529f14a598022023-07-27T06:27:26ZengWiley-VCHAdvanced Materials Interfaces2196-73502023-07-011021n/an/a10.1002/admi.202300179Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine RemovalEleonora Pargoletti0Marco Scavini1Saveria Santangelo2Giovanni Consolati3Giuseppina Cerrato4Martina Longoni5Salvatore Patané6Mariangela Longhi7Giuseppe Cappelletti8Dipartimento di Chimica Università degli Studi di Milano via Golgi 19 20133 Milano ItalyDipartimento di Chimica Università degli Studi di Milano via Golgi 19 20133 Milano ItalyConsorzio Interuniversitario Nazionale per la Scienza e Tecnologia dei Materiali (INSTM) Via Giusti 9 50121 Firenze ItalyDepartment of Aerospace Science and Technology Politecnico di Milano via La Masa 34 20156 Milano ItalyDipartimento di Chimica & NIS Università degli Studi di Torino Via P. Giuria 7 10125 Torino ItalyDipartimento di Chimica Università degli Studi di Milano via Golgi 19 20133 Milano ItalyConsorzio Interuniversitario Nazionale per la Scienza e Tecnologia dei Materiali (INSTM) Via Giusti 9 50121 Firenze ItalyDipartimento di Chimica Università degli Studi di Milano via Golgi 19 20133 Milano ItalyDipartimento di Chimica Università degli Studi di Milano via Golgi 19 20133 Milano ItalyAbstract Graphene oxide (GO) with different oxidation degrees is prepared by a modified Hummers’ method varying KMnO4 amount from 0.5 to 6.0 g. X‐ray powder diffraction (XRPD), micro–Raman, thermogravimetric analysis, X‐ray photoeelectron spectroscopy, Boehm titrations, high–resolution transmission electron microscopy, and, finally, positron annihilation lifetime spectroscopy (PALS) are exploited to assess the properties of GO. Results show that increasing oxidant species can tune the interlayer gap between GO sheets up to a maximum value in the case of 4.0 g KMnO4 content. Moreover, these results validate the two‐component‐based model of GO in which, at low oxidation degree, there are unsplit/isolated graphene planes, instead at higher oxidant amounts, a five‐layer sandwiched configuration occurs comprising graphene planes having functional groups decorating the edges (bwGO), hydrated oxidative debris (OD) and “empty” spaces (revealed by PALS as the distance between (bwGO + OD) two‐component layers). In addition, by XRPD analysis, the total gap between two sheets is easily computed. In order to correlate these findings to pollutant removal capability, planar o‐toluidine adsorption is studied. Since this molecule diffuses in an aqueous environment, the obtained adsorption percentages are compared to the thickness of the hydrated OD grafted onto bwGO. A strict connection between the pollutant removal efficacy and the variation of the hydrated interlayer distance is found.https://doi.org/10.1002/admi.202300179exfoliationgraphene oxideso‐toluidine adsorptionoxidation degreespositron annihilation lifetime spectroscopy technique |
| spellingShingle | Eleonora Pargoletti Marco Scavini Saveria Santangelo Giovanni Consolati Giuseppina Cerrato Martina Longoni Salvatore Patané Mariangela Longhi Giuseppe Cappelletti Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine Removal Advanced Materials Interfaces exfoliation graphene oxides o‐toluidine adsorption oxidation degrees positron annihilation lifetime spectroscopy technique |
| title | Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine Removal |
| title_full | Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine Removal |
| title_fullStr | Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine Removal |
| title_full_unstemmed | Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine Removal |
| title_short | Tuning the Interlayer Distance of Graphene Oxide as a Function of the Oxidation Degree for o‐Toluidine Removal |
| title_sort | tuning the interlayer distance of graphene oxide as a function of the oxidation degree for o toluidine removal |
| topic | exfoliation graphene oxides o‐toluidine adsorption oxidation degrees positron annihilation lifetime spectroscopy technique |
| url | https://doi.org/10.1002/admi.202300179 |
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