Temperature Effect on the Growth Rate and Physical Characteristics of SnO2 Thin Films Grown by Atomic Layer Deposition

Temperature Effect on the Growth Rate and Physical Characteristics of SnO2 Thin Films Grown by Atomic Layer Deposition

Among the various thin film coating techniques, atomic layer deposition (ALD) has features of good controllability of the thickness, excellent step-coverage in 3-dimensional object even in the sub-nm thickness range at the relatively low deposition temperature. In this study, SnO2 thin films were gr...

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Bibliographic Details
Main Authors: Daeho Kim, Dong Ha Kim, Doh-Hyung Riu, Byung Joon Choi
Format: Article
Language:English
Published: Polish Academy of Sciences 2018-06-01
Series:Archives of Metallurgy and Materials
Subjects:
atomic layer deposition
tin oxide
growth rate
film density
optical band gap
Online Access:https://journals.pan.pl/Content/106723/PDF/AMM-2018-2-69-Choi.pdf

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