Structure and optical properties of TiO2 thin films deposited by ALD method
This paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2017-12-01
|
| Series: | Open Physics |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/phys-2017-0137 |
| _version_ | 1819007375474950144 |
|---|---|
| author | Szindler Marek Szindler Magdalena M. Boryło Paulina Jung Tymoteusz |
| author_facet | Szindler Marek Szindler Magdalena M. Boryło Paulina Jung Tymoteusz |
| author_sort | Szindler Marek |
| collection | DOAJ |
| description | This paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical composition were also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2 was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry. |
| first_indexed | 2024-12-21T00:23:35Z |
| format | Article |
| id | doaj.art-d2535e0525dd4109a3a586017399a1dc |
| institution | Directory Open Access Journal |
| issn | 2391-5471 |
| language | English |
| last_indexed | 2024-12-21T00:23:35Z |
| publishDate | 2017-12-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | Open Physics |
| spelling | doaj.art-d2535e0525dd4109a3a586017399a1dc2022-12-21T19:22:02ZengDe GruyterOpen Physics2391-54712017-12-011511067107110.1515/phys-2017-0137phys-2017-0137Structure and optical properties of TiO2 thin films deposited by ALD methodSzindler Marek0Szindler Magdalena M.1Boryło Paulina2Jung Tymoteusz3Institute of Engineering Materials and Biomaterials, Silesian University of Technology, Konarskiego 18a, 44-100Gliwice, PolandInstitute of Engineering Materials and Biomaterials, Silesian University of Technology, Konarskiego 18a, 44-100Gliwice, PolandInstitute of Engineering Materials and Biomaterials, Silesian University of Technology, Konarskiego 18a, 44-100Gliwice, PolandInstitute of Engineering Materials and Biomaterials, Silesian University of Technology, Konarskiego 18a, 44-100Gliwice, PolandThis paper presents the results of study on titanium dioxide thin films prepared by atomic layer deposition method on a silicon substrate. The changes of surface morphology have been observed in topographic images performed with the atomic force microscope (AFM) and scanning electron microscope (SEM). Obtained roughness parameters have been calculated with XEI Park Systems software. Qualitative studies of chemical composition were also performed using the energy dispersive spectrometer (EDS). The structure of titanium dioxide was investigated by X-ray crystallography. A variety of crystalline TiO2 was also confirmed by using the Raman spectrometer. The optical reflection spectra have been measured with UV-Vis spectrophotometry.https://doi.org/10.1515/phys-2017-0137photovoltaicsilicon solar cellatomic layer depositionantireflection coating42.25.bs68.35.ct68.37.-d |
| spellingShingle | Szindler Marek Szindler Magdalena M. Boryło Paulina Jung Tymoteusz Structure and optical properties of TiO2 thin films deposited by ALD method Open Physics photovoltaic silicon solar cell atomic layer deposition antireflection coating 42.25.bs 68.35.ct 68.37.-d |
| title | Structure and optical properties of TiO2 thin films deposited by ALD method |
| title_full | Structure and optical properties of TiO2 thin films deposited by ALD method |
| title_fullStr | Structure and optical properties of TiO2 thin films deposited by ALD method |
| title_full_unstemmed | Structure and optical properties of TiO2 thin films deposited by ALD method |
| title_short | Structure and optical properties of TiO2 thin films deposited by ALD method |
| title_sort | structure and optical properties of tio2 thin films deposited by ald method |
| topic | photovoltaic silicon solar cell atomic layer deposition antireflection coating 42.25.bs 68.35.ct 68.37.-d |
| url | https://doi.org/10.1515/phys-2017-0137 |
| work_keys_str_mv | AT szindlermarek structureandopticalpropertiesoftio2thinfilmsdepositedbyaldmethod AT szindlermagdalenam structureandopticalpropertiesoftio2thinfilmsdepositedbyaldmethod AT boryłopaulina structureandopticalpropertiesoftio2thinfilmsdepositedbyaldmethod AT jungtymoteusz structureandopticalpropertiesoftio2thinfilmsdepositedbyaldmethod |