Study the Effect of Rapid Thermal Annealing on Thin Films Prepared By Pulse Laser Deposition Method
In this paper, the synthesis of nanocrystalline Nickel oxide (NiO) thin films on quartz substrates using a pulsed 532 nm Q-Switched Nd: YAG laser is presented, the annealing temperature was varied from (200 - 400 ˚C). The X-ray diffraction (XRD) results show that the deposited films are crystalline...
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| Định dạng: | Bài viết |
| Ngôn ngữ: | English |
| Được phát hành: |
Unviversity of Technology- Iraq
2014-03-01
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| Loạt: | Engineering and Technology Journal |
| Những chủ đề: | |
| Truy cập trực tuyến: | https://etj.uotechnology.edu.iq/article_102382_6ed621ec51d526e0522e466d6da20b05.pdf |