Sulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InP

Metalorganic chemical vapor deposition was used to grow single-crystalline tetragonal β-In2S3 films on InP to afford covalently bonded In2S3/InP heterostructures, with the crystal structure of these films identified by high-resolution scanning transmission electron microscopy, X-ray diffraction, and...

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Main Authors: TaeWan Kim, Hyeji Park, Hyeoksu Bae, Minhyuk Jo, Soo-Hwan Jeong, Sang Jun Lee, Jae Cheol Shin, Sang-Woo Kang
Format: Article
Language:English
Published: AIP Publishing LLC 2017-12-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5000935
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author TaeWan Kim
Hyeji Park
Hyeoksu Bae
Minhyuk Jo
Soo-Hwan Jeong
Sang Jun Lee
Jae Cheol Shin
Sang-Woo Kang
author_facet TaeWan Kim
Hyeji Park
Hyeoksu Bae
Minhyuk Jo
Soo-Hwan Jeong
Sang Jun Lee
Jae Cheol Shin
Sang-Woo Kang
author_sort TaeWan Kim
collection DOAJ
description Metalorganic chemical vapor deposition was used to grow single-crystalline tetragonal β-In2S3 films on InP to afford covalently bonded In2S3/InP heterostructures, with the crystal structure of these films identified by high-resolution scanning transmission electron microscopy, X-ray diffraction, and Raman spectroscopy analyses, and the corresponding bandgap energies determined by photoluminescence measurements at room (300 K) and low temperatures (40 K). RT-PL measurements reveal the three peaks spectral emission at 464.3, 574.7, and 648.5 nm associated with luminescence from band-edge and two above conduction band-edge, respectively, although the LT-PL (40K) measurements of β-In2S3 film found two dominant peaks. Moreover, the above films exhibited n-type conductivity, with background electron concentration = 4.9 × 1015 cm–3, electron mobility = 1810.9 cm2 V–1 s–1, and resistivity = 0.704 Ω cm. Thus, single-crystalline β-In2S3 films deposited on InP are promising constituents of high-performance next-generation electronic, optoelectronic, and photovoltaic devices.
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spelling doaj.art-d3a30506d26047dd95b6b21c05fd9e6f2022-12-22T03:18:57ZengAIP Publishing LLCAIP Advances2158-32262017-12-01712125109125109-610.1063/1.5000935031712ADVSulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InPTaeWan Kim0Hyeji Park1Hyeoksu Bae2Minhyuk Jo3Soo-Hwan Jeong4Sang Jun Lee5Jae Cheol Shin6Sang-Woo Kang7Vacuum Technology Center, Korea Research Institute of Standards and Science, Daejeon 305-340, KoreaVacuum Technology Center, Korea Research Institute of Standards and Science, Daejeon 305-340, KoreaDivision of Convergence Technology, Korea Research Institute of Standards and Science, Daejeon 305-340, KoreaDepartment of Physics, Yeungnam University, Gyeongsan 38541, KoreaDepartment of Chemical Engineering, Kyungpook National University, 80 Daehak-ro, Pook-gu, Daegu 41566, KoreaDivision of Convergence Technology, Korea Research Institute of Standards and Science, Daejeon 305-340, KoreaDepartment of Physics, Yeungnam University, Gyeongsan 38541, KoreaVacuum Technology Center, Korea Research Institute of Standards and Science, Daejeon 305-340, KoreaMetalorganic chemical vapor deposition was used to grow single-crystalline tetragonal β-In2S3 films on InP to afford covalently bonded In2S3/InP heterostructures, with the crystal structure of these films identified by high-resolution scanning transmission electron microscopy, X-ray diffraction, and Raman spectroscopy analyses, and the corresponding bandgap energies determined by photoluminescence measurements at room (300 K) and low temperatures (40 K). RT-PL measurements reveal the three peaks spectral emission at 464.3, 574.7, and 648.5 nm associated with luminescence from band-edge and two above conduction band-edge, respectively, although the LT-PL (40K) measurements of β-In2S3 film found two dominant peaks. Moreover, the above films exhibited n-type conductivity, with background electron concentration = 4.9 × 1015 cm–3, electron mobility = 1810.9 cm2 V–1 s–1, and resistivity = 0.704 Ω cm. Thus, single-crystalline β-In2S3 films deposited on InP are promising constituents of high-performance next-generation electronic, optoelectronic, and photovoltaic devices.http://dx.doi.org/10.1063/1.5000935
spellingShingle TaeWan Kim
Hyeji Park
Hyeoksu Bae
Minhyuk Jo
Soo-Hwan Jeong
Sang Jun Lee
Jae Cheol Shin
Sang-Woo Kang
Sulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InP
AIP Advances
title Sulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InP
title_full Sulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InP
title_fullStr Sulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InP
title_full_unstemmed Sulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InP
title_short Sulfurization-induced growth of single-crystalline high-mobility β-In2S3 films on InP
title_sort sulfurization induced growth of single crystalline high mobility β in2s3 films on inp
url http://dx.doi.org/10.1063/1.5000935
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