Optimization of Copper Electroforming Process Parameters Based on Double Hidden Layer BP Neural Network
In order to optimize the pulse electroforming copper process, a double hidden layer BP (back propagation) neural network was constructed. Through sample training, the mapping relationship between electroforming copper process conditions and target properties was accurately established, and the predi...
Main Authors: | Feng Ji, Chao Chen, Yongfei Zhao, Byungwon Min |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2021-09-01
|
Series: | Micromachines |
Subjects: | |
Online Access: | https://www.mdpi.com/2072-666X/12/10/1157 |
Similar Items
-
Graphene Growth on Electroformed Copper Substrates by Atmospheric Pressure CVD
by: Lorenzo Pedrazzetti, et al.
Published: (2022-02-01) -
Method of electroplating and electroforming gold in an ultrasonic field /
by: 286884 Schneider, Edward B., et al.
Published: (1969) -
Research on the Prediction Method of Centrifugal Pump Performance Based on a Double Hidden Layer BP Neural Network
by: Wei Han, et al.
Published: (2019-07-01) -
An Effect of Layered Auxiliary Cathode on Thickness Uniformity in Micro Electroforming Process
by: Huan Wang, et al.
Published: (2023-06-01) -
Effect of Pulse Frequency on the Microstructure and the Degradation of Pulse Electroformed Zinc for Fabricating the Shell of Biodegradable Dosing Pump
by: Shuhui Wu, et al.
Published: (2022-06-01)