Research on the influence of stamping materials on resist flow and the residual layer in thermal nanoimprint lithography

Abstract Various stamp materials can significantly affect the filling quality of nanoimprint lithography (NIL). The effects of different stamp materials on the imprinting process were investigated from the angles of residual layer (RL) thickness, contact pressure, and filling proportion. The selecti...

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Bibliographic Details
Main Authors: Hong‐Wen Sun, Tian‐Hua Tang, Jing‐Sheng Wang, Li‐Jun Gu, Yan‐Chun Huang, Ya‐Ru Li
Format: Article
Language:English
Published: Wiley 2023-09-01
Series:Micro & Nano Letters
Subjects:
Online Access:https://doi.org/10.1049/mna2.12175