Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry Facility
Objectives: This study was designed to evaluate exposure levels of various chemicals used in wafer fabrication product lines in the semiconductor industry where work-related leukemia has occurred. Methods: The research focused on 9 representative wafer fabrication bays among a total of 25 bays in a...
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| Format: | Article |
| Language: | English |
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Elsevier
2011-03-01
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| Series: | Safety and Health at Work |
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| Online Access: | http://www.sciencedirect.com/science/article/pii/S2093791111210060 |
| _version_ | 1797712906543955968 |
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| author | Hyunhee Park Jae-Kil Jang Jung-Ah Shin |
| author_facet | Hyunhee Park Jae-Kil Jang Jung-Ah Shin |
| author_sort | Hyunhee Park |
| collection | DOAJ |
| description | Objectives: This study was designed to evaluate exposure levels of various chemicals used in wafer fabrication product lines in the semiconductor industry where work-related leukemia has occurred.
Methods: The research focused on 9 representative wafer fabrication bays among a total of 25 bays in a semiconductor product line. We monitored the chemical substances categorized as human carcinogens with respect to leukemia as well as harmful chemicals used in the bays and substances with hematologic and reproductive toxicities to evaluate the overall health effect for semiconductor industry workers. With respect to monitoring, active and passive sampling techniques were introduced. Eight-hour long-term and 15-minute short-term sampling was conducted for the area as well as on personal samples.
Results: The results of the measurements for each substance showed that benzene, toluene, xylene, n-butyl acetate, 2-methoxyethanol, 2-heptanone, ethylene glycol, sulfuric acid, and phosphoric acid were non-detectable (ND) in all samples. Arsine was either “ND” or it existed only in trace form in the bay air. The maximum exposure concentration of fluorides was approximately 0.17% of the Korea occupational exposure limits, with hydrofluoric acid at about 0.2%, hydrochloric acid 0.06%, nitric acid 0.05%, isopropyl alcohol 0.4%, and phosphine at about 2%. The maximum exposure concentration of propylene glycol monomethyl ether acetate (PGMEA) was 0.0870 ppm, representing only 0.1% or less than the American Industrial Hygiene Association recommended standard (100 ppm).
Conclusion: Benzene, a known human carcinogen for leukemia, and arsine, a hematologic toxin, were not detected in wafer fabrication sites in this study. Among reproductive toxic substances, n-butyl acetate was not detected, but fluorides and PGMEA existed in small amounts in the air. This investigation was focused on the air-borne chemical concentrations only in regular working conditions. Unconditional exposures during spills and/or maintenance tasks and by-product chemicals were not included. Supplementary studies might be required. |
| first_indexed | 2024-03-12T07:28:40Z |
| format | Article |
| id | doaj.art-d8afeb199fbf4f4bade8f636ea8d83ee |
| institution | Directory Open Access Journal |
| issn | 2093-7911 |
| language | English |
| last_indexed | 2024-03-12T07:28:40Z |
| publishDate | 2011-03-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Safety and Health at Work |
| spelling | doaj.art-d8afeb199fbf4f4bade8f636ea8d83ee2023-09-02T22:01:49ZengElsevierSafety and Health at Work2093-79112011-03-0121395110.5491/SHAW.2011.2.1.39Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry FacilityHyunhee Park0Jae-Kil Jang1Jung-Ah Shin2Work Environment Research Department, Occupational Safety and Health Research InstituteOccupational Safety and Health Training Institute, Korea Occupational Safety and Health Agency, Incheon, KoreaWork Environment Research Department, Occupational Safety and Health Research InstituteObjectives: This study was designed to evaluate exposure levels of various chemicals used in wafer fabrication product lines in the semiconductor industry where work-related leukemia has occurred. Methods: The research focused on 9 representative wafer fabrication bays among a total of 25 bays in a semiconductor product line. We monitored the chemical substances categorized as human carcinogens with respect to leukemia as well as harmful chemicals used in the bays and substances with hematologic and reproductive toxicities to evaluate the overall health effect for semiconductor industry workers. With respect to monitoring, active and passive sampling techniques were introduced. Eight-hour long-term and 15-minute short-term sampling was conducted for the area as well as on personal samples. Results: The results of the measurements for each substance showed that benzene, toluene, xylene, n-butyl acetate, 2-methoxyethanol, 2-heptanone, ethylene glycol, sulfuric acid, and phosphoric acid were non-detectable (ND) in all samples. Arsine was either “ND” or it existed only in trace form in the bay air. The maximum exposure concentration of fluorides was approximately 0.17% of the Korea occupational exposure limits, with hydrofluoric acid at about 0.2%, hydrochloric acid 0.06%, nitric acid 0.05%, isopropyl alcohol 0.4%, and phosphine at about 2%. The maximum exposure concentration of propylene glycol monomethyl ether acetate (PGMEA) was 0.0870 ppm, representing only 0.1% or less than the American Industrial Hygiene Association recommended standard (100 ppm). Conclusion: Benzene, a known human carcinogen for leukemia, and arsine, a hematologic toxin, were not detected in wafer fabrication sites in this study. Among reproductive toxic substances, n-butyl acetate was not detected, but fluorides and PGMEA existed in small amounts in the air. This investigation was focused on the air-borne chemical concentrations only in regular working conditions. Unconditional exposures during spills and/or maintenance tasks and by-product chemicals were not included. Supplementary studies might be required.http://www.sciencedirect.com/science/article/pii/S2093791111210060SemiconductorCarcinogenReproductive toxinHematologic toxicityBenzeneArsine |
| spellingShingle | Hyunhee Park Jae-Kil Jang Jung-Ah Shin Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry Facility Safety and Health at Work Semiconductor Carcinogen Reproductive toxin Hematologic toxicity Benzene Arsine |
| title | Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry Facility |
| title_full | Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry Facility |
| title_fullStr | Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry Facility |
| title_full_unstemmed | Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry Facility |
| title_short | Quantitative Exposure Assessment of Various Chemical Substances in a Wafer Fabrication Industry Facility |
| title_sort | quantitative exposure assessment of various chemical substances in a wafer fabrication industry facility |
| topic | Semiconductor Carcinogen Reproductive toxin Hematologic toxicity Benzene Arsine |
| url | http://www.sciencedirect.com/science/article/pii/S2093791111210060 |
| work_keys_str_mv | AT hyunheepark quantitativeexposureassessmentofvariouschemicalsubstancesinawaferfabricationindustryfacility AT jaekiljang quantitativeexposureassessmentofvariouschemicalsubstancesinawaferfabricationindustryfacility AT jungahshin quantitativeexposureassessmentofvariouschemicalsubstancesinawaferfabricationindustryfacility |