APA-ийн эшлэл(7 дахь хэвлэлт)

Kumada, T., Ohtsuka, M., & Fukuyama, H. (2015). Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering. AIP Publishing LLC.

Чикаго-гийн эшлэл (17 дахь хэвлэлт)

Kumada, Tomoyuki, Makoto Ohtsuka, ба Hiroyuki Fukuyama. Influence of Substrate Temperature on the Crystalline Quality of AlN Layers Deposited by RF Reactive Magnetron Sputtering. AIP Publishing LLC, 2015.

MLA -ийн эшлэл (9 дэх хэвлэлт)

Kumada, Tomoyuki, et al. Influence of Substrate Temperature on the Crystalline Quality of AlN Layers Deposited by RF Reactive Magnetron Sputtering. AIP Publishing LLC, 2015.