APA引文

Kumada, T., Ohtsuka, M., & Fukuyama, H. (2015). Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering. AIP Publishing LLC.

Chicago Style (17th ed.) Citation

Kumada, Tomoyuki, Makoto Ohtsuka, and Hiroyuki Fukuyama. Influence of Substrate Temperature on the Crystalline Quality of AlN Layers Deposited by RF Reactive Magnetron Sputtering. AIP Publishing LLC, 2015.

MLA引文

Kumada, Tomoyuki, et al. Influence of Substrate Temperature on the Crystalline Quality of AlN Layers Deposited by RF Reactive Magnetron Sputtering. AIP Publishing LLC, 2015.