Kumada, T., Ohtsuka, M., & Fukuyama, H. (2015). Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering. AIP Publishing LLC.
芝加哥风格引文Kumada, Tomoyuki, Makoto Ohtsuka, 与 Hiroyuki Fukuyama. Influence of Substrate Temperature on the Crystalline Quality of AlN Layers Deposited by RF Reactive Magnetron Sputtering. AIP Publishing LLC, 2015.
MLA引文Kumada, Tomoyuki, et al. Influence of Substrate Temperature on the Crystalline Quality of AlN Layers Deposited by RF Reactive Magnetron Sputtering. AIP Publishing LLC, 2015.
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