Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering
Aluminum nitride (AlN) is a promising material for use in applications such as ultraviolet light-emitting diodes and surface acoustic wave devices. In this study, AlN layers were fabricated on nitrided sapphire substrates using radio-frequency (RF) reactive magnetron sputtering. An AlN layer sputter...
| Principais autores: | , , |
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| Formato: | Artigo |
| Idioma: | English |
| Publicado em: |
AIP Publishing LLC
2015-01-01
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| coleção: | AIP Advances |
| Acesso em linha: | http://dx.doi.org/10.1063/1.4906796 |