Cell Culture on Low-Fluorescence and High-Resolution Photoresist
2D and 3D topographic cues made of photoresist, a polymer, are used for cell culture and cell analysis. Photoresists used for cell analysis provide the surface conditions necessary for proper cell growth, along with patterning properties of a wide range and high precision, and low auto-fluorescence...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-06-01
|
| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/11/6/571 |
| _version_ | 1797566119561658368 |
|---|---|
| author | Hidetaka Ueno Katsuya Maruo Masatoshi Inoue Hidetoshi Kotera Takaaki Suzuki |
| author_facet | Hidetaka Ueno Katsuya Maruo Masatoshi Inoue Hidetoshi Kotera Takaaki Suzuki |
| author_sort | Hidetaka Ueno |
| collection | DOAJ |
| description | 2D and 3D topographic cues made of photoresist, a polymer, are used for cell culture and cell analysis. Photoresists used for cell analysis provide the surface conditions necessary for proper cell growth, along with patterning properties of a wide range and high precision, and low auto-fluorescence that does not affect fluorescence imaging. In this study, we developed a thick negative photoresist SJI-001 possessing the aforementioned properties. We evaluated the surface conditions of SJI-001 affecting cell culture. First, we studied the wettability of SJI-001, which was changed by plasma treatment, conducted as a pretreatment on a plastic substrate before cell seeding. SJI-001 was more chemically stable than SU-8 used for fabricating the micro-electromechanical systems (MEMS). Furthermore, the doubling time and adhesion rate of adherent HeLa cells cultured on untreated SJI-001 were 25.2 h and 74%, respectively, thus indicating its suitability for cell culture over SU-8. In addition, we fabricated a cell culture plate with a 3D lattice structure, three micrometers in size, using SJI-001. HeLa cells seeded on this plate remained attached over five days. Therefore, SJI-001 exhibits surface conditions suitable for cell culture and has several bioapplications including microstructures and cell chips for cell culture and cell analysis. |
| first_indexed | 2024-03-10T19:22:13Z |
| format | Article |
| id | doaj.art-d987814284f3487c83975e7312b66efb |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-10T19:22:13Z |
| publishDate | 2020-06-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Micromachines |
| spelling | doaj.art-d987814284f3487c83975e7312b66efb2023-11-20T02:53:30ZengMDPI AGMicromachines2072-666X2020-06-0111657110.3390/mi11060571Cell Culture on Low-Fluorescence and High-Resolution PhotoresistHidetaka Ueno0Katsuya Maruo1Masatoshi Inoue2Hidetoshi Kotera3Takaaki Suzuki4Division of Mechanical Science and Technology, Gunma University, Kiryu 376-8515, JapanInnovation Park, Daicel Corporation, Himeji 671-1283, JapanDivision of Intelligent Mechanical Systems Engineering, Kagawa University, Takamatsu 761-0396, JapanRIKEN, Wako 351-0198, JapanDivision of Mechanical Science and Technology, Gunma University, Kiryu 376-8515, Japan2D and 3D topographic cues made of photoresist, a polymer, are used for cell culture and cell analysis. Photoresists used for cell analysis provide the surface conditions necessary for proper cell growth, along with patterning properties of a wide range and high precision, and low auto-fluorescence that does not affect fluorescence imaging. In this study, we developed a thick negative photoresist SJI-001 possessing the aforementioned properties. We evaluated the surface conditions of SJI-001 affecting cell culture. First, we studied the wettability of SJI-001, which was changed by plasma treatment, conducted as a pretreatment on a plastic substrate before cell seeding. SJI-001 was more chemically stable than SU-8 used for fabricating the micro-electromechanical systems (MEMS). Furthermore, the doubling time and adhesion rate of adherent HeLa cells cultured on untreated SJI-001 were 25.2 h and 74%, respectively, thus indicating its suitability for cell culture over SU-8. In addition, we fabricated a cell culture plate with a 3D lattice structure, three micrometers in size, using SJI-001. HeLa cells seeded on this plate remained attached over five days. Therefore, SJI-001 exhibits surface conditions suitable for cell culture and has several bioapplications including microstructures and cell chips for cell culture and cell analysis.https://www.mdpi.com/2072-666X/11/6/571low-fluorescencehigh resolutionphotoresistcell analysiscell chipmicro and nanotechnology |
| spellingShingle | Hidetaka Ueno Katsuya Maruo Masatoshi Inoue Hidetoshi Kotera Takaaki Suzuki Cell Culture on Low-Fluorescence and High-Resolution Photoresist Micromachines low-fluorescence high resolution photoresist cell analysis cell chip micro and nanotechnology |
| title | Cell Culture on Low-Fluorescence and High-Resolution Photoresist |
| title_full | Cell Culture on Low-Fluorescence and High-Resolution Photoresist |
| title_fullStr | Cell Culture on Low-Fluorescence and High-Resolution Photoresist |
| title_full_unstemmed | Cell Culture on Low-Fluorescence and High-Resolution Photoresist |
| title_short | Cell Culture on Low-Fluorescence and High-Resolution Photoresist |
| title_sort | cell culture on low fluorescence and high resolution photoresist |
| topic | low-fluorescence high resolution photoresist cell analysis cell chip micro and nanotechnology |
| url | https://www.mdpi.com/2072-666X/11/6/571 |
| work_keys_str_mv | AT hidetakaueno cellcultureonlowfluorescenceandhighresolutionphotoresist AT katsuyamaruo cellcultureonlowfluorescenceandhighresolutionphotoresist AT masatoshiinoue cellcultureonlowfluorescenceandhighresolutionphotoresist AT hidetoshikotera cellcultureonlowfluorescenceandhighresolutionphotoresist AT takaakisuzuki cellcultureonlowfluorescenceandhighresolutionphotoresist |