Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation
We investigate the evolution of two dimensional transient enhanced diffusion (TED) of phosphorus in sub-micron scale patterned silicon template. Samples doped with low dose phosphorus with and without high dose silicon self-implantation, were annealed for various durations. Dopant diffusion is probe...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2015-10-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4934674 |
| _version_ | 1818116596400390144 |
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| author | Kuan-Kan Hu Ruey-Dar Chang Wei Yen Woon |
| author_facet | Kuan-Kan Hu Ruey-Dar Chang Wei Yen Woon |
| author_sort | Kuan-Kan Hu |
| collection | DOAJ |
| description | We investigate the evolution of two dimensional transient enhanced diffusion (TED) of phosphorus in sub-micron scale patterned silicon template. Samples doped with low dose phosphorus with and without high dose silicon self-implantation, were annealed for various durations. Dopant diffusion is probed with plane-view scanning capacitance microscopy. The measurement revealed two phases of TED. Significant suppression in the second phase TED is observed for samples with high dose self-implantation. Transmission electron microscopy suggests the suppressed TED is related to the evolution of end of range defect formed around ion implantation sidewalls. |
| first_indexed | 2024-12-11T04:25:02Z |
| format | Article |
| id | doaj.art-db0132bf3be44b20af47630c943a33e0 |
| institution | Directory Open Access Journal |
| issn | 2158-3226 |
| language | English |
| last_indexed | 2024-12-11T04:25:02Z |
| publishDate | 2015-10-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | AIP Advances |
| spelling | doaj.art-db0132bf3be44b20af47630c943a33e02022-12-22T01:21:00ZengAIP Publishing LLCAIP Advances2158-32262015-10-01510107128107128-510.1063/1.4934674048510ADVSuppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formationKuan-Kan Hu0Ruey-Dar Chang1Wei Yen Woon2Department of Physics, National Central University, Jungli, 32054, Taiwan, Republic of ChinaChang Gung University, Taoyuan, Taiwan 33302, Republic of ChinaDepartment of Physics, National Central University, Jungli, 32054, Taiwan, Republic of ChinaWe investigate the evolution of two dimensional transient enhanced diffusion (TED) of phosphorus in sub-micron scale patterned silicon template. Samples doped with low dose phosphorus with and without high dose silicon self-implantation, were annealed for various durations. Dopant diffusion is probed with plane-view scanning capacitance microscopy. The measurement revealed two phases of TED. Significant suppression in the second phase TED is observed for samples with high dose self-implantation. Transmission electron microscopy suggests the suppressed TED is related to the evolution of end of range defect formed around ion implantation sidewalls.http://dx.doi.org/10.1063/1.4934674 |
| spellingShingle | Kuan-Kan Hu Ruey-Dar Chang Wei Yen Woon Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation AIP Advances |
| title | Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation |
| title_full | Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation |
| title_fullStr | Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation |
| title_full_unstemmed | Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation |
| title_short | Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation |
| title_sort | suppression of transient enhanced diffusion in sub micron patterned silicon template by dislocation loops formation |
| url | http://dx.doi.org/10.1063/1.4934674 |
| work_keys_str_mv | AT kuankanhu suppressionoftransientenhanceddiffusioninsubmicronpatternedsilicontemplatebydislocationloopsformation AT rueydarchang suppressionoftransientenhanceddiffusioninsubmicronpatternedsilicontemplatebydislocationloopsformation AT weiyenwoon suppressionoftransientenhanceddiffusioninsubmicronpatternedsilicontemplatebydislocationloopsformation |