Correlative AFM and Scanning Microlens Microscopy for Time‐Efficient Multiscale Imaging

Abstract With the rapid evolution of microelectronics and nanofabrication technologies, the feature sizes of large‐scale integrated circuits continue to move toward the nanoscale. There is a strong need to improve the quality and efficiency of integrated circuit inspection, but it remains a great ch...

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Bibliographic Details
Main Authors: Tianyao Zhang, Haibo Yu, Jialin Shi, Xiaoduo Wang, Hao Luo, Daojing Lin, Zhu Liu, Chanmin Su, Yuechao Wang, Lianqing Liu
Format: Article
Language:English
Published: Wiley 2022-04-01
Series:Advanced Science
Subjects:
Online Access:https://doi.org/10.1002/advs.202103902