Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies

Abstract Two‐photon polymerization (TPP) has become a premier state‐of‐the‐art method for microscale fabrication of bespoke polymeric devices and surfaces. With applications ranging from the production of optical, drug delivery, tissue engineering, and microfluidic devices, TPP has grown immensely i...

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Main Authors: Seán O'Halloran, Abhay Pandit, Andreas Heise, Andrew Kellett
Format: Article
Language:English
Published: Wiley 2023-03-01
Series:Advanced Science
Subjects:
Online Access:https://doi.org/10.1002/advs.202204072
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author Seán O'Halloran
Abhay Pandit
Andreas Heise
Andrew Kellett
author_facet Seán O'Halloran
Abhay Pandit
Andreas Heise
Andrew Kellett
author_sort Seán O'Halloran
collection DOAJ
description Abstract Two‐photon polymerization (TPP) has become a premier state‐of‐the‐art method for microscale fabrication of bespoke polymeric devices and surfaces. With applications ranging from the production of optical, drug delivery, tissue engineering, and microfluidic devices, TPP has grown immensely in the past two decades. Significantly, the field has expanded from standard acrylate‐ and epoxy‐based photoresists to custom formulated monomers designed to change the hydrophilicity, surface chemistry, mechanical properties, and more of the resulting structures. This review explains the essentials of TPP, from its initial conception through to standard operating principles and advanced chemical modification strategies for TPP materials. At the outset, the fundamental chemistries of radical and cationic polymerization are described, along with strategies used to tailor mechanical and functional properties. This review then describes TPP systems and introduces an array of commonly used photoresists including hard polyacrylic resins, soft hydrogel acrylic esters, epoxides, and organic/inorganic hybrid materials. Specific examples of each class—including chemically modified photoresists—are described to inform the understanding of their applications to the fields of tissue‐engineering scaffolds, micromedical, optical, and drug delivery devices.
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spelling doaj.art-db14b45bcf7547729e7c3cc7e572ad122023-03-03T08:59:14ZengWileyAdvanced Science2198-38442023-03-01107n/an/a10.1002/advs.202204072Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification StrategiesSeán O'Halloran0Abhay Pandit1Andreas Heise2Andrew Kellett3CÚRAM the SFI Research Centre for Medical Devices School of Chemical Sciences Dublin City University Glasnevin Dublin 9 IrelandCÚRAM the SFI Research Centre for Medical Devices University of Galway Galway H91 W2TY IrelandRCSI University of Medicine and Health Sciences Department of Chemistry 123 St. Stephens Green Dublin Dublin 2 IrelandCÚRAM the SFI Research Centre for Medical Devices School of Chemical Sciences Dublin City University Glasnevin Dublin 9 IrelandAbstract Two‐photon polymerization (TPP) has become a premier state‐of‐the‐art method for microscale fabrication of bespoke polymeric devices and surfaces. With applications ranging from the production of optical, drug delivery, tissue engineering, and microfluidic devices, TPP has grown immensely in the past two decades. Significantly, the field has expanded from standard acrylate‐ and epoxy‐based photoresists to custom formulated monomers designed to change the hydrophilicity, surface chemistry, mechanical properties, and more of the resulting structures. This review explains the essentials of TPP, from its initial conception through to standard operating principles and advanced chemical modification strategies for TPP materials. At the outset, the fundamental chemistries of radical and cationic polymerization are described, along with strategies used to tailor mechanical and functional properties. This review then describes TPP systems and introduces an array of commonly used photoresists including hard polyacrylic resins, soft hydrogel acrylic esters, epoxides, and organic/inorganic hybrid materials. Specific examples of each class—including chemically modified photoresists—are described to inform the understanding of their applications to the fields of tissue‐engineering scaffolds, micromedical, optical, and drug delivery devices.https://doi.org/10.1002/advs.2022040723D laser printingdirect laser writingmodification strategiesphotoresiststwo‐photon polymerization
spellingShingle Seán O'Halloran
Abhay Pandit
Andreas Heise
Andrew Kellett
Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies
Advanced Science
3D laser printing
direct laser writing
modification strategies
photoresists
two‐photon polymerization
title Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies
title_full Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies
title_fullStr Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies
title_full_unstemmed Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies
title_short Two‐Photon Polymerization: Fundamentals, Materials, and Chemical Modification Strategies
title_sort two photon polymerization fundamentals materials and chemical modification strategies
topic 3D laser printing
direct laser writing
modification strategies
photoresists
two‐photon polymerization
url https://doi.org/10.1002/advs.202204072
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AT abhaypandit twophotonpolymerizationfundamentalsmaterialsandchemicalmodificationstrategies
AT andreasheise twophotonpolymerizationfundamentalsmaterialsandchemicalmodificationstrategies
AT andrewkellett twophotonpolymerizationfundamentalsmaterialsandchemicalmodificationstrategies