Static and Kinetic Studies of the Adsorption/Desorption of H and OH Ions on Alumina in Aqueous NaNO Solution

The adsorption/desorption of H + and OH − ions under static conditions on to alumina in aqueous NaNO 3 solution was studied at 30°C by potentiometric titration and calculations undertaken using the triple layer model (TLM). Intrinsic dissociation constants and intrinsic complexation constants at 30°...

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Bibliographic Details
Main Authors: Chu Taiwei, Du Jinzhou, Tao Zuyi
Format: Article
Language:English
Published: SAGE Publications 1997-05-01
Series:Adsorption Science & Technology
Online Access:https://doi.org/10.1177/026361749701500503
Description
Summary:The adsorption/desorption of H + and OH − ions under static conditions on to alumina in aqueous NaNO 3 solution was studied at 30°C by potentiometric titration and calculations undertaken using the triple layer model (TLM). Intrinsic dissociation constants and intrinsic complexation constants at 30°C were used to calculate surface charge density, surface potential and surface species as a function of pH and ionic strength (I). Related adsorption/desorption studies of H + and OH − ions under dynamic conditions on to alumina in aqueous NaNO 3 solution were studied by means of the concentration-jump technique. Mechanistic information regarding H + and OH − ion adsorption/desorption on to alumina was discussed using the experimental data in conjunction with the TLM.
ISSN:0263-6174
2048-4038