Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid Mechanism

Abstract Conventional vapor–liquid–solid mechanism of nanowire growth opens up new opportunities of fabricating nanowires with controllable morphologies and aspect ratios. However, gaseous precursors have disadvantages of high material and processing cost, high toxicity, and limited scalability. By...

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Main Authors: Thao Nguyen, Chu‐Hsiu Hsu, Der‐Hsien Lien, Yu‐Sheng Su
Format: Article
Language:English
Published: Wiley-VCH 2023-02-01
Series:Advanced Materials Interfaces
Subjects:
Online Access:https://doi.org/10.1002/admi.202202247
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author Thao Nguyen
Chu‐Hsiu Hsu
Der‐Hsien Lien
Yu‐Sheng Su
author_facet Thao Nguyen
Chu‐Hsiu Hsu
Der‐Hsien Lien
Yu‐Sheng Su
author_sort Thao Nguyen
collection DOAJ
description Abstract Conventional vapor–liquid–solid mechanism of nanowire growth opens up new opportunities of fabricating nanowires with controllable morphologies and aspect ratios. However, gaseous precursors have disadvantages of high material and processing cost, high toxicity, and limited scalability. By contrast, synthesizing nanowires via solid–liquid–solid mechanism could be a facile alternative since the low cost and nontoxic solid precursor is adopted in the process. In this study, the cooling control is found to be very critical for the solid–liquid–solid nanowire growth. Without a sufficient negative vertical temperature gradient, the nucleation and continuous growth of silicon nanowires could not occur. High volume gas flow cooling, fluctuating the heating temperature, decreasing the cooling rate, and applying a heat sink are all efficacious to promote silicon nanowire formation. In addition to the nanowires formed under high gas flow cooling on the silicon wafer sputtered with a nickel thin film, the solid–liquid–solid mechanism‐derived silicon nanowire growth can also be economically achieved by adopting a solution‐based coating of a nickel precursor onto the silicon substrate paired with a programmed slow cooling condition without using any gas, which could be transferred to other eutectic systems for cost‐effective nanomaterial fabrication.
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spelling doaj.art-dbc4a5afaa1e4da3bcb2cd7b5b3f047c2023-08-31T09:02:04ZengWiley-VCHAdvanced Materials Interfaces2196-73502023-02-01106n/an/a10.1002/admi.202202247Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid MechanismThao Nguyen0Chu‐Hsiu Hsu1Der‐Hsien Lien2Yu‐Sheng Su3International College of Semiconductor Technology National Yang Ming Chiao Tung University 1001 University Road Hsinchu 30010 TaiwanInstitute of Electronics College of Electrical and Computer Engineering National Yang Ming Chiao Tung University 1001 University Road Hsinchu 30010 TaiwanInstitute of Electronics College of Electrical and Computer Engineering National Yang Ming Chiao Tung University 1001 University Road Hsinchu 30010 TaiwanInternational College of Semiconductor Technology National Yang Ming Chiao Tung University 1001 University Road Hsinchu 30010 TaiwanAbstract Conventional vapor–liquid–solid mechanism of nanowire growth opens up new opportunities of fabricating nanowires with controllable morphologies and aspect ratios. However, gaseous precursors have disadvantages of high material and processing cost, high toxicity, and limited scalability. By contrast, synthesizing nanowires via solid–liquid–solid mechanism could be a facile alternative since the low cost and nontoxic solid precursor is adopted in the process. In this study, the cooling control is found to be very critical for the solid–liquid–solid nanowire growth. Without a sufficient negative vertical temperature gradient, the nucleation and continuous growth of silicon nanowires could not occur. High volume gas flow cooling, fluctuating the heating temperature, decreasing the cooling rate, and applying a heat sink are all efficacious to promote silicon nanowire formation. In addition to the nanowires formed under high gas flow cooling on the silicon wafer sputtered with a nickel thin film, the solid–liquid–solid mechanism‐derived silicon nanowire growth can also be economically achieved by adopting a solution‐based coating of a nickel precursor onto the silicon substrate paired with a programmed slow cooling condition without using any gas, which could be transferred to other eutectic systems for cost‐effective nanomaterial fabrication.https://doi.org/10.1002/admi.202202247amorphous silicon nanowirenanomaterialsnickel oxidenickel‐silicon alloyvapor–liquid–solid
spellingShingle Thao Nguyen
Chu‐Hsiu Hsu
Der‐Hsien Lien
Yu‐Sheng Su
Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid Mechanism
Advanced Materials Interfaces
amorphous silicon nanowire
nanomaterials
nickel oxide
nickel‐silicon alloy
vapor–liquid–solid
title Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid Mechanism
title_full Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid Mechanism
title_fullStr Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid Mechanism
title_full_unstemmed Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid Mechanism
title_short Economical Silicon Nanowire Growth via Cooling Controlled Solid–Liquid–Solid Mechanism
title_sort economical silicon nanowire growth via cooling controlled solid liquid solid mechanism
topic amorphous silicon nanowire
nanomaterials
nickel oxide
nickel‐silicon alloy
vapor–liquid–solid
url https://doi.org/10.1002/admi.202202247
work_keys_str_mv AT thaonguyen economicalsiliconnanowiregrowthviacoolingcontrolledsolidliquidsolidmechanism
AT chuhsiuhsu economicalsiliconnanowiregrowthviacoolingcontrolledsolidliquidsolidmechanism
AT derhsienlien economicalsiliconnanowiregrowthviacoolingcontrolledsolidliquidsolidmechanism
AT yushengsu economicalsiliconnanowiregrowthviacoolingcontrolledsolidliquidsolidmechanism